K
Kevin Chan
Researcher at Cadence Design Systems
Publications - 10
Citations - 302
Kevin Chan is an academic researcher from Cadence Design Systems. The author has contributed to research in topics: Stepper & Automated optical inspection. The author has an hindex of 7, co-authored 10 publications receiving 299 citations.
Papers
More filters
Patent
Method and system for mask optimization
Kevin Chan,Emmanuel Drege,Nickhil Jakatdar,Svetlana Litvintseva,Mark A. Miller,Francis Raquel +5 more
TL;DR: In this article, a method and apparatus for mask optimization is provided, where the parameters may include information such as parametric information, functional information, and hot spots determination, and the mask design and production is optimized by providing proper weighting parameters for critical features.
Proceedings ArticleDOI
Enhanced dispositioning of reticle defects using the Virtual Stepper with automated defect severity scoring
TL;DR: In this paper, the authors used the Virtual Stepper System with its newly developed automated defect severity scoring (ADSS) function to predict the printability of binary OPC masks.
Patent
Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing
Kevin Chan,Emmanuel Drege,Nickhil Jakatdar,Svetlana Litvintseva,Mark A. Miller,Francis Raquel +5 more
TL;DR: In this article, a method and apparatus for modeling and cross correlation of design predicted criticalities include a feedback loop where information from the manufacturing process is provided to cross correlation engine for optimization of semiconductor manufacturing.
Patent
Method and system for inspection optimization
Kevin Chan,Emmanuel Drege,Nickhil Jakatdar,Svetlana Litvintseva,Mark A. Miller,Francis Raquel +5 more
TL;DR: In this article, a method and apparatus for inspection optimization is provided to improve the parametric and functional yield using optimized inspection lists for in-line semiconductor manufacturing metrology and inspection equipment.
Patent
Method and system for process optimization
Kevin Chan,Emmanuel Drege,Nickhil Jakatdar,Svetlana Litvintseva,Mark A. Miller,Francis Raquel +5 more
TL;DR: In this article, a method and apparatus for process optimization for post mask manufacturing is presented, which improves parametric and functional yield of post mask production, and improves post mask quality.