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Khaled Karrai

Researcher at Ludwig Maximilian University of Munich

Publications -  128
Citations -  9264

Khaled Karrai is an academic researcher from Ludwig Maximilian University of Munich. The author has contributed to research in topics: Quantum dot & Exciton. The author has an hindex of 45, co-authored 128 publications receiving 8832 citations.

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Device and method for acquiring position with a confocal Fabry-Perot interferometer

Khaled Karrai, +1 more
TL;DR: In this paper, a device for acquiring position with a confocal Fabry-Perot interferometer is described, and a method for detecting the interference pattern to obtain a measuring signal is presented.
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Voltage-controlled linewidth of excitonic transitions in a single self-assembled quantum dot

TL;DR: In this article, electron and hole tunnelling phenomena in a single self-assembled quantum dot as a function of the applied electric field were reported, and absorption spectroscopy was used to measure excitonic transitions under conditions where optical recombination cannot be observed due to the high, ionizing, electric field.
Journal ArticleDOI

Charged magneto-exciton states in semiconductor quantum dots

TL;DR: In this article, the authors present the results of photoluminescence experiments as a function of both charge and magnetic field and demonstrate a hierarchy of energy scales determined by quantization, the direct Coulomb interaction, the electron-electron exchange interaction, and the electron−hole exchange interaction.
Journal ArticleDOI

Controlled charging of the same single quantum dot from +6e to ‐8e: emission, shell filling and configuration interactions

TL;DR: In this paper, the authors present photoluminescence spectra from single InAs/GaAs quantum dots embedded in a Schottky diode heterostructure and demonstrate a number of effects.
Journal ArticleDOI

Versatile Multilevel Soft Lithography Method with Micrometer Alignment Using All-Flexible Rubber Stamps and Moiré Fringe Technique

TL;DR: An alignment method using additive type moiré fringe technique that is easy to implement and does not require extensive processing steps is employed and can be used for several soft lithography techniques.