K
Kyogoku Shinya
Researcher at Toshiba
Publications - 4
Citations - 99
Kyogoku Shinya is an academic researcher from Toshiba. The author has contributed to research in topics: Silicon carbide & Semiconductor. The author has an hindex of 3, co-authored 4 publications receiving 70 citations.
Papers
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Journal ArticleDOI
1200 V SiC IE-UMOSFET with low on-resistance and high threshold voltage
Shinsuke Harada,Yusuke Kobayashi,Akimasa Kinoshita,Naoyuki Ohse,Takahito Kojima,M. Iwaya,Hiromu Shiomi,Hidenori Kitai,Kyogoku Shinya,K. Ariyoshi,Yasuhiko Onishi,Hitoshi Kimura +11 more
TL;DR: In this paper, a SiC UMOSFET is developed to cope with the trade-off between low on-resistance and extremely low gate oxide field, which is known as gate oxide protection.
Proceedings ArticleDOI
Ultra low inductance power module for fast switching SiC power devices
Kazuto Takao,Kyogoku Shinya +1 more
TL;DR: In this paper, a novel packaging structure for high-speed switching silicon carbide (SiC) power modules has been proposed based on antiparalleled phase leg units (PLEU).
Journal ArticleDOI
Role of Trench Bottom Shielding Region on Switching Characteristics of 4H-SiC Double-Trench Mosfets
Kyogoku Shinya,Katsuhisa Tanaka,Keiko Ariyoshi,Ryosuke Iijima,Yusuke Kobayashi,Shinsuke Harada +5 more
TL;DR: In this paper, the effect of gate trench bottom p+ region (BPR) on the dynamic characteristics of 4H-SiC double-trench MOSFETs was investigated.
Patent
Super-junction silicon carbide semiconductor device and method for manufacturing super-junction silicon carbide semiconductor device
TL;DR: In this article, a super junction silicon carbide semiconductor device is presented, which includes a first conductive type first column region (1) for epitaxial growth and a second conductive Type Second Column Region (2) for ion implantation.