L
Leslie H. Allen
Researcher at University of Illinois at Urbana–Champaign
Publications - 85
Citations - 5032
Leslie H. Allen is an academic researcher from University of Illinois at Urbana–Champaign. The author has contributed to research in topics: Thin film & Annealing (metallurgy). The author has an hindex of 33, co-authored 82 publications receiving 4808 citations. Previous affiliations of Leslie H. Allen include Cornell University & National Institute of Standards and Technology.
Papers
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1 000 000 °C/s thin film electrical heater: In situ resistivity measurements of Al and Ti/Si thin films during ultra rapid thermal annealing
TL;DR: In this article, a high-current dc electrical pulse is applied to a conductive substrate-heater material (Si), and joule heating occurs thus heating the thin film.
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Heat capacity measurements of Sn nanostructures using a thin-film differential scanning calorimeter with 0.2 nJ sensitivity
TL;DR: In this article, a thin-film differential scanning calorimetry technique has been developed that has extremely high sensitivity of 0.2 nJ. By combining two calorimeters in a differential measurement configuration, the heat capacity and melting process of Sn nanostructures formed via thermal evaporation with deposition thickness down to 1 A.
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Scanning calorimeter for nanoliter-scale liquid samples
E. A. Olson,M. Yu. Efremov,A. T. Kwan,S. L. Lai,V. Petrova,François Schiettekatte,J. T. Warren,Meng Zhang,Leslie H. Allen +8 more
TL;DR: In this paper, a scanning calorimeter was introduced for use with a single solid or liquid sample with a volume down to a few nanoliters, which was demonstrated with the melting of 52 nL of indium, using heating rates from 100 to 1000 K/s.
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Thin-film differential scanning calorimetry: A new probe for assignment of the glass transition of ultrathin polymer films
TL;DR: In this article, the authors demonstrate a MEMS-based thin-film differential scanning calorimetry (TDSC) device, which shows potential for studies of glass transition for films with nanometer-range thickness.
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Microstructural aspects and mechanism of the C49‐to‐C54 polymorphic transformation in titanium disilicide
TL;DR: In this paper, microstructural study of the C49-TiSi2 to C54-SiSi2 polymorphic transformation has been performed to elucidate micro-structural evolution and possible mechanism of the phase transformation.