L
Leslie H. Allen
Researcher at University of Illinois at Urbana–Champaign
Publications - 85
Citations - 5032
Leslie H. Allen is an academic researcher from University of Illinois at Urbana–Champaign. The author has contributed to research in topics: Thin film & Annealing (metallurgy). The author has an hindex of 33, co-authored 82 publications receiving 4808 citations. Previous affiliations of Leslie H. Allen include Cornell University & National Institute of Standards and Technology.
Papers
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Journal ArticleDOI
Anomalous transitions of DODAB using fast scanning liquid calorimetry
Lito P. de la Rama,Liang Hu,Mikhail Yu. Efremov,E. A. Olson,Paul F. Nealey,Mark A. McLean,Stephen G. Sligar,Leslie H. Allen +7 more
TL;DR: Anomalous melting transitions are observed on dimethyl dioctadecyl ammonium bromide (DODAB) using a fast-scanning liquid calorimeter as mentioned in this paper.
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Ion mixing kinetics study by in situ resistance measurements in the Au/Si system
TL;DR: The relationship between sheet resistance of the irradiated samples and the growth of an amorphous Au5 Si2 layer as measured by Rutherford backscattering has been established in this system as mentioned in this paper.
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Kinetics of thin-film reactions of Cu/a-Ge bilayers
TL;DR: In this article, the authors studied the kinetics of the Cu3Ge phase formation during reactions between polycrystalline Cu (poly-Cu) and 600 nm amorphous Ge (a-Ge) layers on Si (100) substrates.
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Approaching the size limit of organometallic layers: synthesis and characterization of highly ordered silver-thiolate lamellae with ultra-short chain lengths.
TL;DR: The first systematic synthesis and characterization study of a wide range of highly ordered silver alkanethiolate (AgSCnH2n+1 or AgSCn, n = 1-16) aliphatic lamellae is reported.
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Fabrication, characterization and modeling of single-crystal thin film calorimeter sensors
Yonathan Anahory,M. Guihard,D. Smeets,R. Karmouch,François Schiettekatte,P. Vasseur,Patrick Desjardins,Liang Hu,Leslie H. Allen,E. Leon-Gutierrez,Javier Rodríguez-Viejo +10 more
TL;DR: In this paper, the authors present a nanocalorimeter for single-crystal Si surface processes and show that the silicon surface is as pure as a standard silicon wafer and that it is susceptible to standard surface cleaning procedures.