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Maneesh Chandran

Researcher at Technion – Israel Institute of Technology

Publications -  41
Citations -  605

Maneesh Chandran is an academic researcher from Technion – Israel Institute of Technology. The author has contributed to research in topics: Diamond & Chemical vapor deposition. The author has an hindex of 15, co-authored 33 publications receiving 488 citations. Previous affiliations of Maneesh Chandran include Indian Institute of Technology Madras.

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Growth and characterization of integrated nano- and microcrystalline dual layer composite diamond coatings on WC–Co substrates

TL;DR: In this paper, integrated composite diamond (ICD) coatings have been achieved with top layer nanocrystallinity, low friction coefficient and enhanced integrity using hot filament chemical vapour deposition technique.
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Nitrogen termination of single crystal (100) diamond surface by radio frequency N2 plasma process: An in-situ x-ray photoemission spectroscopy and secondary electron emission studies

TL;DR: In this article, the electronic and chemical properties of nitrogen terminated (N-terminated) single crystal (100) diamond surface, which is a promising candidate for shallow NV− centers, were systematically investigated under well-controlled conditions by in-situ x-ray photoelectron spectroscopy and secondary electron emission.
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Wear performance of diamond coated WC-Co tools with a CrN interlayer

TL;DR: In this paper, the wear performance of diamond-coated WC-Co cutting tools with a CrN interlayer by machining Al-Si alloys was reported. But, their performance in impact tests was not as high.
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Engineered CVD Diamond Coatings for Machining and Tribological Applications

TL;DR: In this paper, the properties and performance of chemical vapor deposited diamond coatings on tungsten carbide (WC-Co) substrates were discussed with an emphasis on WC-Co grade selection, substrate pretreatment, nanocrystallinity and microcrystallinity of the coating, mechanical and tribological characteristics, coating architecture, and interfacial adhesion integrity.