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Marta Clement

Researcher at Technical University of Madrid

Publications -  121
Citations -  1747

Marta Clement is an academic researcher from Technical University of Madrid. The author has contributed to research in topics: Resonator & Thin film. The author has an hindex of 22, co-authored 116 publications receiving 1600 citations. Previous affiliations of Marta Clement include ETSI.

Papers
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Piezoelectric properties and residual stress of sputtered AlN thin films for MEMS applications

TL;DR: In this article, the suitability of piezoelectric aluminium nitride (AlN) films deposited by RF sputtering as the actuating element in microelectromechanical system (MEMS) devices was investigated.
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SAW characteristics of AlN films sputtered on silicon substrates.

TL;DR: The electroacoustic responses of the SAW filters were fitted by computations based on a simple circuital model that takes into account parasitic effects such as airborne electromagnetic coupling and conduction through the substrate, providing accurate values of the electromechanical coupling factor k2 even for devices with poor characteristics.
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Influence of sputtering mechanisms on the preferred orientation of aluminum nitride thin films

TL;DR: In this article, the influence of sputtering parameters on the preferred orientation of polycrystalline aluminum nitride thin films was studied, and different mechanisms influencing the preferred orientations of the films were considered, especially the transfer of energy to the adatoms on the substrate by particle bombardment.
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Degradation of the piezoelectric response of sputtered c-axis AlN thin films with traces of non-(0002) x-ray diffraction peaks

TL;DR: In this article, the authors observed the anomalous behavior of sputtered AlN thin films that exhibit poor piezoelectric response in spite of having (0002) preferred orientation and narrow rocking curve with full width at half maximum below 2°.
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Influence of oxygen and argon on the crystal quality and piezoelectric response of AlN sputtered thin films

TL;DR: In this paper, the effect of oxygen and argon impurities on the residual stress, crystal structure and piezoelectric response of sputtered AlN thin films for surface acoustic wave applications was investigated.