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Martin Hulman

Researcher at Slovak Academy of Sciences

Publications -  13
Citations -  159

Martin Hulman is an academic researcher from Slovak Academy of Sciences. The author has contributed to research in topics: Graphene & Raman spectroscopy. The author has an hindex of 5, co-authored 13 publications receiving 117 citations.

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Reliable determination of the few-layer graphene oxide thickness using Raman spectroscopy

TL;DR: In this paper, a reference-free Raman spectroscopy method was proposed for a precise thickness determination of the multilayered graphene oxide flakes, which is based on the normalization of the total integral intensity of D and G Raman bands to the integral intensity on the second-order optical phonon peak of the silicon substrate in the Raman spectrum.
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Investigation of the shift of Raman modes of graphene flakes

TL;DR: In this paper, the authors used Raman spectroscopy as sensitive tool for the characterization of graphene samples and observed diverse shifts in the position of the Raman mode close to 2650 cm -1 in various as-prepared graphene flakes.
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Influence of GaN/AlGaN/GaN (0001) and Si (100) substrates on structural properties of extremely thin MoS2 films grown by pulsed laser deposition

TL;DR: Very thin MoS2 films were prepared on hexagonal GaN/AlGaN/GaN (0001) and Si (100) substrates from a stoichiometric target by a pulsed laser deposition.
Proceedings ArticleDOI

MoS 2 thin films prepared by sulfurization

TL;DR: In this paper, a simplified version of the method where a one-zone tube furnace was used, a molybdenum film on a substrate and a sulfur powder were placed in the center of the furnace and heated at temperatures above 800°C.