M
Masao Otaki
Publications - 7
Citations - 45
Masao Otaki is an academic researcher. The author has contributed to research in topics: Mask inspection & Photolithography. The author has an hindex of 4, co-authored 7 publications receiving 45 citations.
Papers
More filters
Proceedings ArticleDOI
Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
Toru Tojo,Toru Tojo,Toru Tojo,Ryoich Hirano,Ryoich Hirano,Hideo Tsuchiya,Junji Oaki,Takeshi Nishizaka,Yasushi Sanada,Kazuto Matsuki,Ikunao Isomura,Riki Ogawa,Noboru Kobayashi,Kazuhiro Nakashima,Shinji Sugihara,Hiromu Inoue,Shinichi Imai,Hitoshi Suzuki,Akihiko Sekine,Makoto Taya,Akemi Miwa,Nobuyuki Yoshioka,Katsumi Ohira,Dong-Hoon Chung,Masao Otaki +24 more
TL;DR: In this paper, a high-resolution mask inspection platform using DUV wavelength has been developed to enable the defect inspection of high quality masks for 65nm node used in 193nm lithography.
Proceedings ArticleDOI
Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond
Nobutaka Kikuiri,Shingo Murakami,Hideo Tsuchiya,Motonari Tateno,Kenichi Takahara,Shinichi Imai,Ryoichi Hirano,Ikunao Isomura,Yoshitake Tsuji,Yukio Tamura,Kenichi Matsumura,Kinya Usuda,Masao Otaki,Osamu Suga,Katsumi Ohira +14 more
TL;DR: In this paper, a mask inspection system, whose inspection light wavelength is 199nm, has been developed, with transmission and reflection inspection mode, and throughput, using 70 nm pixel size, were designed within 2 hours per mask.
Proceedings ArticleDOI
Required performances of reticle inspection system for ArF lithography through analysis of defect printability study
Byung Gook Kim,Keishi Tanaka,Nobuyuki Yoshioka,Naohisa Takayama,Keiichi Hatta,Shingo Murakami,Masao Otaki +6 more
TL;DR: In this paper, the defect printability was investigated under various circumstances such as pitch variation and transmission of halftone film, and the authors suggested detail level of inspection sensitivity that new reticle inspection system should be ready.
Proceedings ArticleDOI
Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography
Motonari Tateno,Naohisa Takayama,Shingo Murakami,Keiichi Hatta,Shinji Akima,Fuyuhiko Matsuo,Masao Otaki,Byung Gook Kim,Keishi Tanaka,Nobuyuki Yoshioka +9 more
TL;DR: Li et al. as discussed by the authors improved DUV laser reticle inspection system LM7000 for 90 nm technology node devices and developed a reflected light inspection as a supplementary method to transmittance light inspection.
Proceedings ArticleDOI
Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era
TL;DR: Wang et al. as discussed by the authors proposed defect size specifications of 65nm and beyond optical mask with various OPC and RET environments, and presented initial data of newly developed 198.5nm inspection wavelength system.