M
Michael Mikulla
Researcher at Fraunhofer Society
Publications - 165
Citations - 2339
Michael Mikulla is an academic researcher from Fraunhofer Society. The author has contributed to research in topics: Amplifier & High-electron-mobility transistor. The author has an hindex of 23, co-authored 154 publications receiving 2120 citations.
Papers
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Proceedings ArticleDOI
High-power diode laser arrays emitting at 2 μm with reduced far-field angle
Marc T. Kelemen,Marcel Rattunde,J. Weber,Christian Pfahler,G. Kaufel,R. Moritz,Johannes Schmitz,Michael Mikulla,Joachim Wagner +8 more
TL;DR: In this article, the authors present results on (AlGaIn) (AsSb) quantum-well diode laser single emitters and linear arrays consisting of 19 emitters on a 1 cm long bar emitting at around 1.9 μm.
Proceedings ArticleDOI
High-power high-brightness ridge-waveguide tapered diode lasers at 14xx nm
Senta Kallenbach,Marc T. Kelemen,Rolf Aidam,R. Losch,Gudrun Kaufel,Michael Mikulla,Guenter Weimann +6 more
TL;DR: In this paper, the authors demonstrate InGaAsP/InP based diode lasers with compressively strained quantum wells and wavelengths around 1480 nm which were grown by solid source MBE.
Reliability of AlGaN/GaN HEMTs under DC- and RF-operation
Michael Dammann,M. Casar,Patrick Waltereit,Wolfgang Bronner,Helmer Konstanzer,Rudiger Quay,Stefan Müller,Michael Mikulla,Oliver Ambacher,P.J. van der Wel,T. Rodle,Reza Behtash,F. Bourgeois,K. Riepe +13 more
TL;DR: In this article, the gate processing technology is used to improve the stability of the gate leakage current and the short term drain voltage robustness under off state condition has been examined by a DC-voltage-step-stress test.
Proceedings ArticleDOI
Reliability and degradation mechanism of 0.25 µm AlGaN/GaN HEMTs under RF stress conditions
Michael Dammann,M. Baeumler,F. Gutle,M. Casar,H. Walcher,Patrick Waltereit,Wolfgang Bronner,Stefan Müller,Rudolf Kiefer,Ruediger Quay,Michael Mikulla,Oliver Ambacher,Andreas Graff,Frank Altmann,M Simon +14 more
TL;DR: In this paper, the reliability and degradation mechanism of AlGaN/GaN single stage amplifiers after 10 GHz stress at a drain voltage of 42 V and channel temperatures above 250°C was investigated using electroluminescence (EL) imaging, infrared thermography, and TEM.
Journal ArticleDOI
Reliability of 100 nm AlGaN/GaN HEMTs for mm-wave applications
Maximilian Dammann,M. Baeumler,Vladimir Polyakov,Peter Brückner,Helmer Konstanzer,Rudiger Quay,Michael Mikulla,Andreas Graff,Michél Simon-Najasek +8 more
TL;DR: Simulation of the stress induced changes of the input characteristics of devices with NiPtAu gate further proves the formation of pits and Ni voids and the median time to failure at Tch = 209 °C can be improved.