N
Norio Saitou
Researcher at Hitachi
Publications - 83
Citations - 765
Norio Saitou is an academic researcher from Hitachi. The author has contributed to research in topics: Lithography & Electron-beam lithography. The author has an hindex of 14, co-authored 83 publications receiving 759 citations. Previous affiliations of Norio Saitou include Nippon Telegraph and Telephone.
Papers
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Patent
Method of fabricating semiconductor circuit devices utilizing multiple exposures
TL;DR: In this paper, the position shift errors for each exposure apparatus are measured and corrected at the time of drawing by means of an electron beam drawing apparatus, thereby enhancing the alignment accuracy.
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Fast proximity effect correction method using a pattern area density map
TL;DR: A new method for proximity effect correction that utilizes newly developed hardware and modifies the exposure dose for each exposure point by referring to a pattern area density map is proposed.
Journal ArticleDOI
Role of Ion Bombardment in Field Emission Current Instability
TL;DR: In this article, the role of ion bombardment in field emission current instability is clarified experimentally by varying the emission current level and pressure over a wide range, and it is found that bombarding ions sputter-off adsorbed gas molecules on the emitter surface and this causes field emissions current fluctuation.
Journal ArticleDOI
Electron‐beam cell‐projection lithography system
Yoshio Sakitani,Haruo Yoda,Hideo Todokoro,Shibata Yukinobu,T. Yamazaki,K. Ohbitu,Norio Saitou,S. Moriyama,Shinji Okazaki,G. Matuoka,Fumio Murai,M. Okumura +11 more
TL;DR: An electron beam exposure system HL•800D has been developed for the mass production of both quarter micron large-scale integrated memories and application specific integrated circuits (ASICs) as mentioned in this paper.
Patent
Methods for measuring optical system, and method and apparatus for exposure using said measuring method
Eiichi Seya,Massaaki Ito,Soichi Katagiri,Tsuneo Terasawa,Minoru Hidaka,Eiji Takeda,Norio Saitou +6 more
TL;DR: In this article, the authors measured the distribution of wavefront distortions in the optics while changing the positions of a light source and an image point inside an exposure field of the optics being observed.