Patent
Methods for measuring optical system, and method and apparatus for exposure using said measuring method
Eiichi Seya,Massaaki Ito,Soichi Katagiri,Tsuneo Terasawa,Minoru Hidaka,Eiji Takeda,Norio Saitou +6 more
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TLDR
In this article, the authors measured the distribution of wavefront distortions in the optics while changing the positions of a light source and an image point inside an exposure field of the optics being observed.Abstract:
A technique and exposure apparatus measures, with a high degree of accuracy, figure and placement errors of individual optical elements constituting optics embedded inside of an exposure apparatus or the like, with the optics kept in an embedded state as they are. The system measures the distribution of wavefront distortions in the optics while changing the positions of a light source and an image point inside an exposure field of the optics being observed. Optimal displacements of reflective surfaces constituting the optics are then found by calculation based on the measured distribution of wave-front distortions. Finally, the positions of the reflective surfaces are corrected in accordance with the calculated optimal displacements. The positions of the reflective surfaces are corrected by individually controlling displacements output by a plurality of actuators attached to each reflective surface and by mechanically modifying appropriate portions of the reflective surfaces.read more
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Journal ArticleDOI
Digital Wavefront Measuring Interferometer for Testing Optical Surfaces and Lenses
TL;DR: The system has been designed to optimize the collection of data to give higher than usual accuracy in measuring the individual elements and final performance of assembled diffraction limited optical systems, and furthermore, the short loop time of a few minutes makes the system an attractive alternative to constraints imposed by test glasses in the optical shop.
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