P
Philip Birch
Researcher at University of Sussex
Publications - 176
Citations - 1587
Philip Birch is an academic researcher from University of Sussex. The author has contributed to research in topics: Optical correlator & Spatial light modulator. The author has an hindex of 20, co-authored 161 publications receiving 1400 citations. Previous affiliations of Philip Birch include Charles Sturt University & University of Western Sydney.
Papers
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AUTOMATIC PLANT PEST DETECTION AND RECOGNITION USING k-MEANS CLUSTERING ALGORITHM AND CORRESPONDENCE FILTERS
TL;DR: This research demonstrates the combination of the k -means clustering algorithm and the correspondence filter to achieve pest detection and recognition and establishes that the recognition probability from the pest image is directly related to the height of the output signal and invers ely proportional to the viewing angles.
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A novel high-accuracy microstereolithography method employing an adaptive electro-optic mask
Maria Farsari,Frederic Claret-Tournier,S Huang,Chris Chatwin,David M. Budgett,Philip Birch,Rupert Young,John D. Richardson +7 more
TL;DR: In this paper, a stereo-photolithography technique to create 3D micro-components using a planar, layer-by-layer, process of exposure has been developed, which is possible to build components with dimensions in the range 50μm-50mm, and feature sizes as small as 5μm with a resolution of less than 1μm.
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A real-time closed-loop liquid crystal adaptive optics system: first results
TL;DR: In this paper, the first results from a real-time closed-loop adaptive optics system incorporating a liquid crystal based corrector device and a Shack-Hartmann wavefront sensor are presented.
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Long-distance Bessel beam propagation through Kolmogorov turbulence.
TL;DR: To overcome the diffraction limits the long-distance propagation of Bessel beams is considered and compared against Gaussian beam properties, which are shown to have a number of benefits over Gaussian beams when propagating through atmospheric turbulence.
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UV microstereolithography system that uses spatial light modulator technology
Chris Chatwin,Maria Farsari,Shiping Huang,Malcolm I. Heywood,Philip Birch,Rupert Young,John T. E. Richardson +6 more
TL;DR: A new stereophotolithography technique utilizing a spatial light modulator (SLM) to create three-dimensional components with a planar, layer-by-layer process of exposure is described, to prove the suitability of these photopolymerization systems for microstereolithography.