scispace - formally typeset
R

R. Hiskes

Researcher at Hewlett-Packard

Publications -  18
Citations -  1578

R. Hiskes is an academic researcher from Hewlett-Packard. The author has contributed to research in topics: Thin film & Metalorganic vapour phase epitaxy. The author has an hindex of 15, co-authored 18 publications receiving 1529 citations.

Papers
More filters
Journal ArticleDOI

Intrinsic electrical transport and magnetic properties of La0.67Ca0.33MnO3 and La0.67Sr0.33MnO3 MOCVD thin films and bulk material.

TL;DR: The limiting low and high temperature resistivities place a limit on the maximum possible magnetoresistance of these materials and may explain why the "colossal" magnetores resistance reported in the literature correlates with the suppression of ${T}_{C}$.
Journal ArticleDOI

Formation and observation of 50 nm polarized domains in PbZr1−xTixO3 thin film using scanning probe microscope

TL;DR: In this article, a nanometer size polarized domains were written in a PbZr1−xTixO3 thin film using an atomic force microscope (AFM) and the relationship between the polarized domain and the grain of the film was investigated.
Journal ArticleDOI

Anneal‐tunable Curie temperature and transport of La0.67Ca0.33MnO3

TL;DR: In this article, resistivity measurements on a La0.67Ca0.33MnO3 film are reported for a series of argon anneals at successively higher temperatures.
Journal ArticleDOI

Local structure, transport, and rare-earth magnetismin the ferrimagnetic perovskite Gd 0.67 Ca 0.33 MnO 3 s

TL;DR: In this paper, single crystal, and metal-organic chemical-vapor deposition thin-film samples were prepared and examined for their electrical, magnetic, and structural properties, and the resistivity and magnetoresistance showed no anomaly near the ferrimagnetic transition.
Journal ArticleDOI

Single source metalorganic chemical vapor deposition of low microwave surface resistance YBa2Cu3O7

TL;DR: YBa2Cu3O7 films 2000-7500 A thick were deposited onto [100] LaAlO3 substrates using a novel single source metalorganic chemical vapor deposition technique.