R
R. Hiskes
Researcher at Hewlett-Packard
Publications - 18
Citations - 1578
R. Hiskes is an academic researcher from Hewlett-Packard. The author has contributed to research in topics: Thin film & Metalorganic vapour phase epitaxy. The author has an hindex of 15, co-authored 18 publications receiving 1529 citations.
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Journal ArticleDOI
Intrinsic electrical transport and magnetic properties of La0.67Ca0.33MnO3 and La0.67Sr0.33MnO3 MOCVD thin films and bulk material.
TL;DR: The limiting low and high temperature resistivities place a limit on the maximum possible magnetoresistance of these materials and may explain why the "colossal" magnetores resistance reported in the literature correlates with the suppression of ${T}_{C}$.
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Formation and observation of 50 nm polarized domains in PbZr1−xTixO3 thin film using scanning probe microscope
T. Hidaka,T. Maruyama,M. Saitoh,N. Mikoshiba,M. Shimizu,T. Shiosaki,L. A. Wills,R. Hiskes,S.A. DiCarolis,Jun Amano +9 more
TL;DR: In this article, a nanometer size polarized domains were written in a PbZr1−xTixO3 thin film using an atomic force microscope (AFM) and the relationship between the polarized domain and the grain of the film was investigated.
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Anneal‐tunable Curie temperature and transport of La0.67Ca0.33MnO3
TL;DR: In this article, resistivity measurements on a La0.67Ca0.33MnO3 film are reported for a series of argon anneals at successively higher temperatures.
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Local structure, transport, and rare-earth magnetismin the ferrimagnetic perovskite Gd 0.67 Ca 0.33 MnO 3 s
G. Jeffrey Snyder,Corwin H. Booth,Frank Bridges,R. Hiskes,S.A. DiCarolis,M. R. Beasley,T. H. Geballe +6 more
TL;DR: In this paper, single crystal, and metal-organic chemical-vapor deposition thin-film samples were prepared and examined for their electrical, magnetic, and structural properties, and the resistivity and magnetoresistance showed no anomaly near the ferrimagnetic transition.
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Single source metalorganic chemical vapor deposition of low microwave surface resistance YBa2Cu3O7
TL;DR: YBa2Cu3O7 films 2000-7500 A thick were deposited onto [100] LaAlO3 substrates using a novel single source metalorganic chemical vapor deposition technique.