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Randall L. Headrick

Researcher at University of Vermont

Publications -  116
Citations -  3740

Randall L. Headrick is an academic researcher from University of Vermont. The author has contributed to research in topics: Thin film & Scattering. The author has an hindex of 30, co-authored 114 publications receiving 3555 citations. Previous affiliations of Randall L. Headrick include Ludwig Maximilian University of Munich & Bell Labs.

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Pentacene Thin Film Growth

TL;DR: In this paper, the authors discuss the processes involved in pentacene film growth, emphasizing differences with respect to inorganic films and the influence of growth parameters such as substrate nature and temperature, the deposition rate, and the kinetic energy of the molecular beam on the structure and morphology of Pentacene films.
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Spontaneous nanoscale corrugation of ion-eroded SiO2: the role of ion-irradiation-enhanced viscous flow.

TL;DR: Ion-assisted viscous relaxation in a thin surface layer is shown to be the dominant smoothing process during erosion; the rate of viscous smoothing scales as (lambda*)(-4) is shown.
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Structure of pentacene thin films

TL;DR: The volume of the unit cell in the thin film phase is almost identical to that of the bulk phase, thus the molecular packing efficiency is effectively the same in both phases as discussed by the authors.
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Structure determination of the Si(111): B(3×3)R30°surface: Subsurface substitutional doping

TL;DR: Synchrotron x-ray diffraction has been used to analyze the ({radical}3{times}{radical3){ital R}30{degree} reconstruction of B/Si(111), finding excellent agreement with in-plane data for a model in which boron sits in every third site of threefold symmetry.