1. Introduction 2. Theoretical foundations 3. Propagation and focusing of optical fields 4. Spatial resolution and position accuracy 5. Nanoscale optical microscopy 6. Near-field optical probes 7. Probe-sample distance control 8. Light emission and optical interaction in nanoscale environments 9. Quantum emitters 10. Dipole emission near planar interfaces 11. Photonic crystals and resonators 12. Surface plasmons 13. Forces in confined fields 14. Fluctuation-induced phenomena 15. Theoretical methods in nano-optics Appendices Index.

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Principles of nano-optics

International Technology Roadmap for Semiconductors 2003の要求清浄度について － シリコンウエハ表面と雰囲気環境に要求される清浄度, 分析方法の現状について －

We report what we believe to be the first evidence of localized nanoscale photonic jets generated at the shadow-side surfaces of micronscale, circular dielectric cylinders illuminated by a plane wave These photonic nanojets have waists smaller than the diffraction limit and propagate over several optical wavelengths without significant diffraction We have found that such nanojets can enhance the backscattering of visible light by nanometer-scale dielectric particles located within the nanojets by several orders of magnitude Not involving evanescent fields and not requiring mechanical scanning, photonic nanojets may provide a new means to detect and image nanoparticles of size well below the diffraction limit This could yield a potential novel ultramicroscopy technique using visible light for detecting proteins, viral particles, and even single molecules; and monitoring molecular synthesis and aggregation processes of importance in many areas of biology, chemistry, material sciences, and tissue engineering

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Photonic nanojet enhancement of backscattering of light by nanoparticles: a potential novel visible-light ultramicroscopy technique

The resolution of conventional optical lens systems is always hampered by the diffraction limit. Recent developments in artificial metamaterials provide new avenues to build hyperlenses and metalenses that are able to image beyond the diffraction limit. Hyperlenses project super-resolution information to the far field through a magnification mechanism, whereas metalenses not only super-resolve subwavelength details but also enable optical Fourier transforms. Recently, there have been numerous designs for hyperlenses and metalenses, bringing fresh theoretical and experimental advances, though future directions and challenges remain to be overcome.

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Hyperlenses and metalenses for far-field super-resolution imaging

Apparatus and method for increasing the sensitivity in the detection of optical coherence tomography and low coherence interferometry (“LCI”) signals by detecting a parallel set of spectral bands, each band being a unique combination of optical frequencies. The LCI broad bandwidth source is split into N spectral bands. The N spectral bands are individually detected and processed to provide an increase in the signal-to-noise ratio by a factor of N. Each spectral band is detected by a separate photo detector and amplified. For each spectral band the signal is band pass filtered around the signal band by analog electronics and digitized, or, alternatively, the signal may be digitized and band pass filtered in software. As a consequence, the shot noise contribution to the signal is reduced by a factor equal to the number of spectral bands. The signal remains the same. The reduction of the shot noise increases the dynamic range and sensitivity of the system.

Apparatus and method for ranging and noise reduction of low coherence interferometry LCI and optical coherence tomography OCT signals by parallel detection of spectral bands

We present a high-spatial-resolution subsurface microscopy technique that significantly increases the numerical aperture of a microscope without introducing an additional spherical aberration. Consequently, the diffraction-limited spatial resolution is improved beyond the limit of standard subsurface microscopy. By realizing a numerical aperture of 3.4, we experimentally demonstrate a lateral spatial resolution of better than 0.23 μm in subsurface inspection of Si integrated circuits at near infrared wavelengths.

High spatial resolution subsurface microscopy

We introduce a new fluorescence microscopy technique that maps the axial position of a fluorophore with subnanometer precision. The interference of the emission of fluorophores in proximity to a reflecting surface results in fringes in the fluorescence spectrum that provide a unique signature of the axial position of the fluorophore. The nanometer sensitivity is demonstrated by measuring the height of a fluorescein monolayer covering a 12-nm step etched in silicon dioxide. In addition, the separation between fluorophores attached to the top or the bottom layer in a lipid bilayer film is determined. We further discuss extension of this microscopy technique to provide resolution of multiple layers spaced as closely as 10 nm for sparse systems.

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Toward nanometer-scale resolution in fluorescence microscopy using spectral self-interference

We present a detailed theoretical analysis and experimental results on a subsurface microscopy technique that significantly improves the light-gathering, resolving, and magnifying power of a conventional optical microscope. The numerical aperture increasing lens (NAIL) is a plano-convex lens placed on the planar surface of an object to enhance the amount of light coupled from subsurface structures within the object. In particular, a NAIL allows for the collection of otherwise inaccessible light at angles beyond the critical angle of the planar surface of the object. Therefore, the limit on numerical aperture increases from unity for conventional subsurface microscopy to the refractive index of the object for NAIL microscopy. Spherical aberration associated with conventional subsurface microscopy is also eliminated by the NAIL. Consequently, both the amount of light collected and diffraction-limited spatial resolution are improved beyond the limits of conventional subsurface microscopy. A theoretical optic...

Theoretical analysis of numerical aperture increasing lens microscopy

We apply the numerical aperture increasing lens technique to subsurface thermal emission microscopy of Si integrated circuits. We achieve improvements in the amount of light collected and the spatial resolution, well beyond the limits of conventional thermal emission microscopy. We experimentally demonstrate a lateral spatial resolution of 1.4 μm and a longitudinal spatial resolution of 7.4 μm, for thermal imaging at free space wavelengths up to 5 μm.

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S.B. Ippolito

Papers

High spatial resolution subsurface microscopy

High spatial resolution subsurface microscopy

Toward nanometer-scale resolution in fluorescence microscopy using spectral self-interference

Theoretical analysis of numerical aperture increasing lens microscopy

High spatial resolution subsurface thermal emission microscopy