Satoshi Gonda

TL;DR: In this paper, the precision measurements of 240 nm-pitch one-dimensional grating standards were carried out using an atomic force microscope (AFM) with a high-resolution three-axis laser interferometer (nanometrological AFM).

TL;DR: An atomic force microscope with a high-resolution three-axis laser interferometer for real-time correction of distorted topographic images has been constructed and investigated in this paper, where standard samples for a scanning probe microscope can be directly calibrated on the basis of stabilized wavelength of He-Ne lasers.

TL;DR: In this paper, the epitaxial growth of CeO2 film on Si(001) was achieved by inserting the growth of a SrTiO3 layer, which was verified by reflection high-energy electron diffraction analysis of the growing surface at a temperature between 650 and 700°C in UHV.

TL;DR: In this article, the intensity oscillation of reflection high-energy electron diffraction (RHEED) was observed in an ArF excimer laser deposition of CeO2 and SrTiO3 films on Si(111) and Si(001) substrates, respectively, under 5×10−7 Pa.

TL;DR: In this paper, the authors developed a new atomic force microscope with differential laser interferometers (DLI-AFM), carried out test measurements of the prototype 1D-grating standards with pitches of 100, 80, 60 and 50 nm using the DLI-AAFM and evaluated the uncertainty in the pitch measurements.