A fast-Fourier-transform method of topography and interferometry is proposed. By computer processing of a noncontour type of fringe pattern, automatic discrimination is achieved between elevation and depression of the object or wave-front form, which has not been possible by the fringe-contour-generation techniques. The method has advantages over moire topography and conventional fringe-contour interferometry in both accuracy and sensitivity. Unlike fringe-scanning techniques, the method is easy to apply because it uses no moving components.

Fourier-transform method of fringe-pattern analysis for computer-based topography and interferometry

The phase-shifting mask consists of a normal transmission mask that has been coated with a transparent layer patterned to ensure that the optical phases of nearest apertures are opposite. Destructive interference between waves from adjacent apertures cancels some diffraction effects and increases the spatial resolution with which such patterns can be projected. A simple theory predicts a near doubling of resolution for illumination with partial incoherence σ < 0.3, and substantial improvements in resolution for σ < 0.7. Initial results obtained with a phase-shifting mask patterned with typical device structures by electron-beam lithography and exposed using a Mann 4800 10× tool reveals a 40-percent increase in usuable resolution with some structures printed at a resolution of 1000 lines/mm. Phase-shifting mask structures can be used to facilitate proximity printing with larger gaps between mask and wafer. Theory indicates that the increase in resolution is accompanied by a minimal decrease in depth of focus. Thus the phase-shifting mask may be the most desirable device for enhancing optical lithography resolution in the VLSI/VHSIC era.

Improving resolution in photolithography with a phase-shifting mask

Context. The Extreme Ultraviolet Imager (EUI) is part of the remote sensing instrument package of the ESA/NASA Solar Orbiter mission that will explore the inner heliosphere and observe the Sun from vantage points close to the Sun and out of the ecliptic. Solar Orbiter will advance the “connection science” between solar activity and the heliosphere.Aims. With EUI we aim to improve our understanding of the structure and dynamics of the solar atmosphere, globally as well as at high resolution, and from high solar latitude perspectives.Methods. The EUI consists of three telescopes, the Full Sun Imager and two High Resolution Imagers, which are optimised to image in Lyman-α and EUV (17.4 nm, 30.4 nm) to provide a coverage from chromosphere up to corona. The EUI is designed to cope with the strong constraints imposed by the Solar Orbiter mission characteristics. Limited telemetry availability is compensated by state-of-the-art image compression, onboard image processing, and event selection. The imposed power limitations and potentially harsh radiation environment necessitate the use of novel CMOS sensors. As the unobstructed field of view of the telescopes needs to protrude through the spacecraft’s heat shield, the apertures have been kept as small as possible, without compromising optical performance. This led to a systematic effort to optimise the throughput of every optical element and the reduction of noise levels in the sensor.Results. In this paper we review the design of the two elements of the EUI instrument: the Optical Bench System and the Common Electronic Box. Particular attention is also given to the onboard software, the intended operations, the ground software, and the foreseen data products.Conclusions. The EUI will bring unique science opportunities thanks to its specific design, its viewpoint, and to the planned synergies with the other Solar Orbiter instruments. In particular, we highlight science opportunities brought by the out-of-ecliptic vantage point of the solar poles, the high-resolution imaging of the high chromosphere and corona, and the connection to the outer corona as observed by coronagraphs.

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The Solar Orbiter EUI instrument: The Extreme Ultraviolet Imager

Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

The Transition Region and Coronal Explorer (TRACE) satellite, launched 2 April 1998, is a NASA Small Explorer (SMEX) that images the solar photosphere, transition region and corona with unprecedented spatial resolution and temporal continuity. To provide continuous coverage of solar phenomena, TRACE is located in a sun-synchronous polar orbit. The ∼700 Mbytes of data which are collected daily are made available for unrestricted use within a few days of observation. The instrument features a 30-cm Cassegrain telescope with a field of view of 8.5×.5 arc min and a spatial resolution of 1 arc sec (0.5 arc sec pixels). TRACE contains multilayer optics and a lumogen-coated CCD detector to record three EUV wavelengths and several UV wavelengths. It observes plasmas at selected temperatures from 6000 K to 10 MK with a typical temporal resolution of less than 1 min.

The Transition Region and Coronal Explorer

In this paper, we present a study on two-channel multilayer mirrors which can operate at two wavelengths in Extreme Ultraviolet (EUV) spectral range. We propose a new method to design two-channel EUV multilayer mirrors with enhanced spectral selectivity. The mirror structure is a stack of two periodic multilayers separated by a buffer layer. We have defined the main parameters which allow adjustment of the distance between different order Bragg’s peak and of wavelength positions of reflectivity minima. Two mirrors have been designed and deposited for solar EUV telescope applications by using this method. The first mirror reflects Fe IX–X line (17.1 nm) and Fe XVI (33.5 nm) lines with attenuation of the He II line (30.4 nm). The second mirror reflects Fe IX–X and He II lines with attenuation of Fe XV (28.4 nm) and Fe XVI lines. Measurements with synchrotron radiation source confirm that, in both cases, for these mirrors, we are able to adjust reflectivity maxima (Bragg peak position) and minima. Such multilayers offer new possibilities for compact design of multi-wavelength EUV telescopes and/or for high spectral selectivity.

Design and performance of two-channel EUV multilayer mirrors with enhanced spectral selectivity

We demonstrate the use of a binary diffractive optical element in a very simple setup to convert the multilobed beam from a low fill factor array of coherent laser diodes into a quasi-Gaussian beam. The phase profile of the grating is determined with a phase retrieval algorithm. Experimentally, the conversion efficiency reaches more than 44%. We also establish that this setup can be used to make an effective measurement of the coherency of the laser array.

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Coherent beam superposition of ten diode lasers with a Dammann grating

In this article, we report that usual multilayer mirror configurations to focus attosecond pulses generate geometric aberrations and can significantly stretch pulses. The numerical simulations show that the effects can be strong enough to delay some parts of the pulses of an attosecond pulse train and make them interfere with the next pulses of the train. The influence of the numerical aperture on the pulse duration is also studied, showing that such effects can occur even with very low numerical apertures.

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Spatiotemporal distortions of attosecond pulses

Since more than 20 years, Laboratoire Charles Fabry and Institut d’Astrophysique Spatiale are involved in development
of the EUV multilayer coating for solar imaging. Previous instruments, such as the SOHO EIT and STEREO EUVI
telescopes, employed the Mo/Si multilayer coatings, which offered at that time the best efficiency and stability. We
present here recent results of the development of highly efficient EUV multilayers coatings at 17.4 nm and 30.4 nm for
the Solar Orbiter mission. New multilayer structures, based on a combination of three materials including aluminum,
have been optimized both theoretically and experimentally. We have succeeded to reduce interfacial roughness of Albased
multilayers down to 0.5 nm via optimization of the multilayer design and the deposition process. The EUV peak
reflectance of Al/Mo/SiC and Al/Mo/B 4 C multilayer coatings reaches 56% at 17.4 nm, the highest value reported up to
now for this wavelength. We have also optimized specific bi-periodic structures that possess two reflection bands in the
EUV range with high spectral selectivity. The EUV reflectivity of these Al-based dual-band coatings are compared with
the Si/Mo/B 4 C baseline coating for Solar Orbiter. Since the stability of reflecting multilayer coating is an important issue
for space missions, we have also studied the temporal stability as well as the resistivity of the coatings to thermal cycling
and to proton irradiation. Experimental results confirm that Al/Mo/SiC and Al/Mo/B 4 C multilayer coatings are good
candidates for the Solar Orbiter EUV imaging telescopes.

Development of multilayer coatings for solar orbiter EUV imaging telescopes

The thin film optical constants are key parameters to carry out optical simulation or optimization of multilayer mirrors with high efficiency. However, for most materials, different sets of optical constants can be found in the literature especially in the EUV range, as these parameters are not as well-known in the EUV as in the visible or wavelength range. In this work, we have used several reflectance and transmittance measurements in the wavelength range from 10 nm to 60 nm. Different optical constant files have been tested and compared with the IMD simulation software. We will present some experimental spectra and theoretical simulations to highlight the existing problem on the reliability of optical constants sets and to discuss potential solutions. We focus our research on a few materials of particular interest in the EUV range such as aluminum, aluminum oxide, molybdenum, zirconium, magnesium, silicon carbide, and boron carbide. These analyses lead us to select the most reliable and accurate optical constants set, or to create the best one from the concatenation of existing data for each material of interest.

Sébastien de Rossi

Papers

Design and performance of two-channel EUV multilayer mirrors with enhanced spectral selectivity

Coherent beam superposition of ten diode lasers with a Dammann grating

Spatiotemporal distortions of attosecond pulses

Development of multilayer coatings for solar orbiter EUV imaging telescopes

Analyses of tabulated optical constants for thin films in the EUV range and application to solar physics multilayer coatings