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Seita Tanemura

Researcher at Industrial Research Institute

Publications -  38
Citations -  396

Seita Tanemura is an academic researcher from Industrial Research Institute. The author has contributed to research in topics: Ion implantation & Thin film. The author has an hindex of 9, co-authored 38 publications receiving 380 citations.

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Tungsten doping into vanadium dioxide thermochromic films by high-energy ion implantation and thermal annealing

TL;DR: In this article, high-energy (1.0 MeV) ion beam implantation and thermal annealing for the first time was performed by high energy ion beam in VO 2 polycrystalline film sputterdeposited on Si.
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V1−xMoxO2 thermochromic films deposited by reactive magnetron sputtering

TL;DR: In this article, the relationship between the transition temperature τ c and x in V 1− x Mo x O 2 was clarified through precise determinations of the dopant concentration and the value of τ c.
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Epitaxial growth of W-doped VO2/V2O3 multilayer on α-Al2O3(110) by reactive magnetron sputtering

TL;DR: In this paper, a multilayer epitaxy with a W-VO2 top layer over a bottom layer, in which the crystal phase depends on the starting oxygen flow, was done on a-Al2O3(110) by reactively sputtering a V-W (1.6 at.% wt.)
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High-energy cu and o ion co-implantation into silica glasses

TL;DR: In this article, optical and structural changes of silica glass substrates implanted with Cu and O ions and subjected to thermal annealing, are examined as a function of the implantation sequence by optical absorption, Rutherford Backscattering Spectrometry (RBS) and thin film X-ray diffraction (XRD) measurements.
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Formation of β‐Si3N4 by nitrogen implantation into SiC

TL;DR: In this article, polycrystalline β-SiC samples were implanted with 50 keV 15N ions with fluences ranging from 3×1017 to 1.5×1018 ions/cm2 at elevated temperature up to 1100 °C.