Single-layer metal dichalcogenides are two-dimensional semiconductors that present strong potential for electronic and sensing applications complementary to that of graphene.

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Electronics and optoelectronics of two-dimensional transition metal dichalcogenides.

The semiconductor ZnO has gained substantial interest in the research community in part because of its large exciton binding energy (60meV) which could lead to lasing action based on exciton recombination even above room temperature. Even though research focusing on ZnO goes back many decades, the renewed interest is fueled by availability of high-quality substrates and reports of p-type conduction and ferromagnetic behavior when doped with transitions metals, both of which remain controversial. It is this renewed interest in ZnO which forms the basis of this review. As mentioned already, ZnO is not new to the semiconductor field, with studies of its lattice parameter dating back to 1935 by Bunn [Proc. Phys. Soc. London 47, 836 (1935)], studies of its vibrational properties with Raman scattering in 1966 by Damen et al. [Phys. Rev. 142, 570 (1966)], detailed optical studies in 1954 by Mollwo [Z. Angew. Phys. 6, 257 (1954)], and its growth by chemical-vapor transport in 1970 by Galli and Coker [Appl. Phys. ...

/pdf/a-comprehensive-review-of-zno-materials-and-devices-21a3zjadem.pdf

A comprehensive review of zno materials and devices

Ultrathin two-dimensional nanosheets of layered transition metal dichalcogenides (TMDs) are fundamentally and technologically intriguing. In contrast to the graphene sheet, they are chemically versatile. Mono- or few-layered TMDs - obtained either through exfoliation of bulk materials or bottom-up syntheses - are direct-gap semiconductors whose bandgap energy, as well as carrier type (n- or p-type), varies between compounds depending on their composition, structure and dimensionality. In this Review, we describe how the tunable electronic structure of TMDs makes them attractive for a variety of applications. They have been investigated as chemically active electrocatalysts for hydrogen evolution and hydrosulfurization, as well as electrically active materials in opto-electronics. Their morphologies and properties are also useful for energy storage applications such as electrodes for Li-ion batteries and supercapacitors.

http://nanotubes.rutgers.edu/PDFs/nchem_TMDs_2013.pdf

The chemistry of two-dimensional layered transition metal dichalcogenide nanosheets

A very sensitive photodector based on molybdenum disulphide with potential for integrated optoelectronic circuits, light sensing, biomedical imaging, video recording or spectroscopy is now demonstrated.

/pdf/ultrasensitive-photodetectors-based-on-monolayer-mos2-2ytu9i2qtp.pdf

Ultrasensitive photodetectors based on monolayer MoS2.

Graphene-Like Two-Dimensional Materials

We report on the fabrication of top-gate phototransistors based on a few-layered MoS2 nanosheet with a transparent gate electrode. Our devices with triple MoS2 layers exhibited excellent photodetection capabilities for red light, while those with single- and double-layers turned out to be quite useful for green light detection. The varied functionalities are attributed to energy gap modulation by the number of MoS2 layers. The photoelectric probing on working transistors with the nanosheets demonstrates that single-layer MoS2 has a significant energy bandgap of 1.8 eV, while those of double- and triple-layer MoS2 reduce to 1.65 and 1.35 eV, respectively.

MoS2 Nanosheet Phototransistors with Thickness-Modulated Optical Energy Gap

We report on the fabrication of gate-stable ZnO thin-film transistors (TFTs) with aluminum oxide dielectric. When an off-stoichiometric AlO x was deposited at room temperature, the ZnO-TFT revealed unreliable transfer characteristics: a large drain current-gate bias (I D -V G ) hysteresis and a large amount of threshold voltage (V T ) shift under gate-bias stress. As rapid thermal annealing (RTA) in O 2 ambient was applied onto AIO X at 300°C prior to ZnO channel deposition, the gate-bias reliability of the ZnO device was improved. The RTA might cause our AlO x surface to be more stoichiometric and thus to be resistant against ZnO sputter-induced damage. When the bottom-gate ZnO-TFT was fabricated with a stoichiometric Al 2 O 3 dielectric grown by atomic layer deposition (ALD), our device showed much more stable electrical characteristics than with the sputter-deposited off-stoichiometric AlO x . Last, as an ultimate effort to improve the gate reliability, we fabricated a top-gate ZnO-TFT device adopting the same thick ALD-grown stoichiometric Al 2 O 3 as in the bottom-gate device. Our top-gate device with the Al 2 O 3 dielectric then showed no hysteresis and no V T shift after several times of gate bias sweep. We conclude that both the high quality dielectric and optimized device structure are necessary to realize electrically stable ZnO-TFTs.

Improving the Gate Stability of ZnO Thin-Film Transistors with Aluminum Oxide Dielectric Layers

We have fabricated 2.5″ QCIF+ bottom emission AM-OLED with aperture ratio of 59.6% using fully transparent ZnO-TFT array and highly conductive oxide/metal/oxide electrode for the first time. The bias stability of ZnO TFT was improved by optimizing ZnO deposition and first gate insulator process. Plasma free process for the gate insulator makes ZnO TFT very stable under electrical bias stress. The Vth shift was less than 0.3V after VDS=25 V and VGS=15 V application for 60 hours. Transparent ZnO TFT characteristics did not change noticeably under irradiation of visible light.

42.3: Transparent ZnO Thin Film Transistor for the Application of High Aperture Ratio Bottom Emission AM‐OLED Display

Violet and UV luminescence emitted from ZnO thin films grown on sapphire by pulsed laser deposition

We report on the photoelectric properties of n-ZnO/p-Si photodiodes which detect UV photons in the depleted n-ZnO and simultaneously detect visible photons in the depleted p-Si. As characterized by I–V measurements in the photon range of 310 to 650 nm our photodiodes exposed to UV photons show a linear increase in photocurrent with reverse bias. In the visible range, the photocurrent rises rapidly with bias but saturates beyond a critical voltage. Our diodes exhibit strong responsivities of 0.5 and 0.3 A/W for UV (310-nm) and red (650-nm) photons, respectively, under a 30-V bias with a weak minimum near 380 nm, the wavelength corresponding to the band gap of ZnO. It is concluded that our n-ZnO/p-Si diode can be a UV-enhanced photodiode that simultaneously detects UV and visible photons by employing two related photoelectric mechanisms in parallel.

Seongil Im

Papers

MoS2 Nanosheet Phototransistors with Thickness-Modulated Optical Energy Gap

Improving the Gate Stability of ZnO Thin-Film Transistors with Aluminum Oxide Dielectric Layers

42.3: Transparent ZnO Thin Film Transistor for the Application of High Aperture Ratio Bottom Emission AM‐OLED Display

Violet and UV luminescence emitted from ZnO thin films grown on sapphire by pulsed laser deposition

Ultraviolet-enhanced photodiode employing n-ZnO/p-Si structure