S
Shurui Wang
Researcher at National Research Council
Publications - 51
Citations - 932
Shurui Wang is an academic researcher from National Research Council. The author has contributed to research in topics: Metamaterial & Photonics. The author has an hindex of 10, co-authored 46 publications receiving 709 citations.
Papers
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Journal ArticleDOI
Broadband polarization independent nanophotonic coupler for silicon waveguides with ultra-high efficiency.
Pavel Cheben,Jens H. Schmid,Shurui Wang,Dan-Xia Xu,Martin Vachon,Siegfried Janz,Jean Lapointe,Yves Painchaud,Marie-Josée Picard +8 more
TL;DR: A subwavelength refractive index engineered nanostructure is demonstrated to mitigate loss and wavelength resonances by suppressing diffraction effects, enabling a coupling efficiency over 92% (0.32 dB) and polarization independent operation for a broad spectral range exceeding 100 nm.
Journal ArticleDOI
Ultra-broadband nanophotonic beamsplitter using an anisotropic sub-wavelength metamaterial
Robert Halir,Pavel Cheben,José Manuel Luque-González,Jose Darío Sarmiento-Merenguel,Jens H. Schmid,G. Wanguemert-Perez,Dan-Xia Xu,Shurui Wang,Alejandro Ortega-Moñux,Íñigo Molina-Fernández +9 more
TL;DR: In this paper, the authors leverage the inherent anisotropy and dispersion of a sub-wavelength structured photonic metamaterial to demonstrate ultra-broadband integrated beamsplitting.
Journal ArticleDOI
Subwavelength index engineered surface grating coupler with sub-decibel efficiency for 220-nm silicon-on-insulator waveguides.
Daniel Benedikovic,Pavel Cheben,Jens H. Schmid,Dan-Xia Xu,Boris Lamontagne,Shurui Wang,Jean Lapointe,Robert Halir,Alejandro Ortega-Moñux,Siegfried Janz,Milan Dado +10 more
TL;DR: This work reports on a grating coupler with sub-decibel experimental coupling efficiency using a single etch process in a standard 220-nm silicon-on-insulator (SOI) platform, and demonstrates a subwavelength metamaterial refractive index engineered nanostructure with backside metal reflector.
Journal ArticleDOI
High-directionality fiber-chip grating coupler with interleaved trenches and subwavelength index-matching structure.
Daniel Benedikovic,Carlos Alonso-Ramos,Pavel Cheben,Jens H. Schmid,Shurui Wang,Dan-Xia Xu,Jean Lapointe,Siegfried Janz,Robert Halir,Alejandro Ortega-Moñux,J. Gonzalo Wangüemert-Pérez,Íñigo Molina-Fernández,Jean-Marc Fedeli,Laurent Vivien,Milan Dado +14 more
TL;DR: A measured fiber-chip coupling efficiency of -1.3 dB is reported, the highest coupling efficiency achieved to date for a surface grating coupler in a 220 nm silicon-on-insulator platform fabricated in a conventional dual-etch process without high-index overlays or bottom mirrors.
Journal ArticleDOI
High-efficiency single etch step apodized surface grating coupler using subwavelength structure
Daniel Benedikovic,Pavel Cheben,Jens H. Schmid,Dan-Xia Xu,Jean Lapointe,Shurui Wang,Robert Halir,Alejandro Ortega-Moñux,Siegfried Janz,Milan Dado +9 more
TL;DR: In this paper, the authors have demonstrated using simulations and experiments that a high coupling efficiency can be achieved for an arbitrary buried oxide thickness by judicious adjustment of the grating radiation angle.