S
Sylvie Godey
Researcher at Centre national de la recherche scientifique
Publications - 40
Citations - 1001
Sylvie Godey is an academic researcher from Centre national de la recherche scientifique. The author has contributed to research in topics: Silicon & Molecular beam epitaxy. The author has an hindex of 16, co-authored 39 publications receiving 946 citations. Previous affiliations of Sylvie Godey include university of lille.
Papers
More filters
Journal ArticleDOI
Gold-free growth of GaAs nanowires on silicon: arrays and polytypism
Sebastien Plissard,Kimberley A. Dick,Guilhem Larrieu,Guilhem Larrieu,Sylvie Godey,Ahmed Addad,Xavier Wallart,Philippe Caroff +7 more
TL;DR: Growth by molecular beam epitaxy and structural characterization of gallium-nucleated GaAs nanowires on silicon and a precise positioning process using a hole array in a dielectric layer thermally grown on silicon are demonstrated.
Journal ArticleDOI
High on-off conductance switching ratio in optically-driven self-assembled conjugated molecular systems
Kacem Smaali,Stéphane Lenfant,Sandrine Karpe,Maitena Ocafrain,Philippe Blanchard,Dominique Deresmes,Sylvie Godey,Alain Rochefort,Jean Roncali,Dominique Vuillaume +9 more
TL;DR: First principles density functional calculations demonstrate a better delocalization of the frontier orbitals as well as a stronger electronic coupling between the azobenzene moiety and the electrode for the cis configuration over the trans one.
Journal ArticleDOI
High On−Off Conductance Switching Ratio in Optically-Driven Self-Assembled Conjugated Molecular Systems
Kacem Smaali,Stéphane Lenfant,Sandrine Karpe,Maitena Ocafrain,Philippe Blanchard,Dominique Deresmes,Sylvie Godey,Alain Rochefort,Jean Roncali,Dominique Vuillaume +9 more
TL;DR: In this paper, a new azobenzene−thiophene molecular switch is designed, synthesized, and used to form self-assembled monolayers (SAM) on gold.
Journal ArticleDOI
Graphene growth by molecular beam epitaxy using a solid carbon source
TL;DR: In this article, the direct elaboration of graphene by molecular beam epitaxy (MBE) has been studied, using a solid carbon source. Successful growth has been achieved on both the carbon and silicon terminated faces of silicon carbide substrates in the temperature range 1000-1100 °C, as confirmed by low energy electron diffraction (LEED) and X-ray photoemission spectroscopy (XPS) analysis.
Journal ArticleDOI
Graphene growth by molecular beam epitaxy on the carbon face of SiC
E. Moreau,Sylvie Godey,Francisco J. Ferrer,D. Vignaud,Xavier Wallart,José Avila,Maria C. Asensio,F. Bournel,J.J. Gallet +8 more
TL;DR: Graphene layers have been grown by molecular beam epitaxy (MBE) on the C-face of SiC and have been characterized by atomic force microscopy, low energy electron diffraction (LEED), and UV photoelectron spectroscopy as mentioned in this paper.