T
Takayuki Iwasaki
Researcher at Tokyo Institute of Technology
Publications - 103
Citations - 2792
Takayuki Iwasaki is an academic researcher from Tokyo Institute of Technology. The author has contributed to research in topics: Diamond & Carbon nanotube. The author has an hindex of 26, co-authored 91 publications receiving 2291 citations. Previous affiliations of Takayuki Iwasaki include Waseda University.
Papers
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Journal ArticleDOI
Germanium-Vacancy Single Color Centers in Diamond.
Takayuki Iwasaki,Fumitaka Ishibashi,Yoshiyuki Miyamoto,Yuki Doi,Satoshi Kobayashi,Takehide Miyazaki,Kosuke Tahara,Kay D. Jahnke,Lachlan J. Rogers,Boris Naydenov,Fedor Jelezko,Satoshi Yamasaki,Shinji Nagamachi,Toshiro Inubushi,Norikazu Mizuochi,Mutsuko Hatano +15 more
TL;DR: In this article, a new color center in diamond, composed of a germanium (Ge) and a vacancy (V), was reported, which has a sharp and strong photoluminescence band with a zero-phonon line at 602 nm at room temperature.
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Tin-Vacancy Quantum Emitters in Diamond.
Takayuki Iwasaki,Yoshiyuki Miyamoto,Takashi Taniguchi,Petr Siyushev,Mathias H. Metsch,Fedor Jelezko,Mutsuko Hatano +6 more
TL;DR: The order of the experimentally obtained optical transition energies, compared with those of Si-V and Ge-V centers, was in good agreement with the theoretical calculations.
Journal ArticleDOI
Low Temperature Synthesis of Extremely Dense and Vertically Aligned Single-Walled Carbon Nanotubes
TL;DR: In this paper, a point-arc microwave plasma chemical vapor deposition (CVD) apparatus was employed to grow single-walled carbon nanotubes (SWNTs) on Si substrates coated with a sandwich-like nano-layer structure.
Journal ArticleDOI
Low temperature grown carbon nanotube interconnects using inner shells by chemical mechanical polishing
Daisuke Yokoyama,Takayuki Iwasaki,Tsuyoshi Yoshida,Hiroshi Kawarada,Shintaro Sato,Takashi Hyakushima,Mizuhisa Nihei,Yuji Awano +7 more
TL;DR: In this article, the electrical properties of MWCNT-via structures with and without chemical mechanical polishing (CMP) were measured for wiring application, and the improved resistance after annealing at 400°C was 0.6Ω for 2μm vias.