T
Theodore H. Geballe
Researcher at Stanford University
Publications - 158
Citations - 9471
Theodore H. Geballe is an academic researcher from Stanford University. The author has contributed to research in topics: Superconductivity & Electrical resistivity and conductivity. The author has an hindex of 48, co-authored 158 publications receiving 9061 citations. Previous affiliations of Theodore H. Geballe include Bell Labs & SLAC National Accelerator Laboratory.
Papers
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Journal ArticleDOI
Low-Frequency Conductivity Due to Hopping Processes in Silicon
TL;DR: In this paper, a simple theory based on the currently accepted model of impurity conduction is given for the higher temperature range, which accounts well for the observed frequency and concentration dependences, but only order-of-magnitude absolute agreement is obtained.
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Origin of Charge Density at LaAlO3 on SrTiO3 Heterointerfaces: Possibility of Intrinsic Doping
Wolter Siemons,Wolter Siemons,Gertjan Koster,Hideki Yamamoto,Hideki Yamamoto,Walter A. Harrison,Gerald Lucovsky,Theodore H. Geballe,Dave H. A. Blank,M. R. Beasley +9 more
TL;DR: Based on transport, spectroscopic, and oxygen-annealing experiments, it is concluded that extrinsic defects in the form of oxygen vacancies introduced by the pulsed laser deposition process used by all researchers to date to make these samples is the source of the large carrier densities.
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Heat Capacity Measurements on Small Samples at Low Temperatures
R. Bachmann,F. J. DiSalvo,Theodore H. Geballe,Richard L. Greene,Richard Howard,C. N. King,H. C. Kirsch,K. N. Lee,Robert E. Schwall,H. U. Thomas,R. B. Zubeck +10 more
TL;DR: In this paper, the authors describe a new calorimeter for measuring heat capacity in the range 1-35 K, using a silicon chip bolometer as sample holder, temperature sensor, and sample heater.
Journal ArticleDOI
Superconductivity in Graphitic Compounds
Journal ArticleDOI
Seebeck Effect in Silicon
Theodore H. Geballe,G. W. Hull +1 more
TL;DR: The Seebeck effect has been measured from liquid hydrogen temperatures into the intrinsic range for a series of single-crystal silicon samples in which varying concentrations of donor and acceptor atoms have been incorporated as discussed by the authors.