T
Tomizo Kurosawa
Researcher at National Institute of Advanced Industrial Science and Technology
Publications - 82
Citations - 1462
Tomizo Kurosawa is an academic researcher from National Institute of Advanced Industrial Science and Technology. The author has contributed to research in topics: Interferometry & Laser. The author has an hindex of 19, co-authored 82 publications receiving 1366 citations. Previous affiliations of Tomizo Kurosawa include Japanese Ministry of International Trade and Industry.
Papers
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Journal ArticleDOI
Sub-hundred nanometre pitch measurements using an AFM with differential laser interferometers for designing usable lateral scales
Ichiko Misumi,Satoshi Gonda,Qiangxian Huang,Taeho Keem,Tomizo Kurosawa,Akihiro Fujii,Nahoko Hisata,Takeshi Yamagishi,Hirohisa Fujimoto,Ken Enjoji,Sunao Aya,Hiroaki Sumitani +11 more
TL;DR: In this paper, the authors developed a new atomic force microscope with differential laser interferometers (DLI-AFM), carried out test measurements of the prototype 1D-grating standards with pitches of 100, 80, 60 and 50 nm using the DLI-AAFM and evaluated the uncertainty in the pitch measurements.
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The relationship between the measurement error and the arrangement of laser trackers in laser trilateration
TL;DR: In this paper, a self-calibration algorithm is used to determine system parameters such as the arrangement of laser trackers and the initial lengths of interferometers in a laser tracking interferometer system.
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Simple, real-time method for removing the cyclic error of a homodyne interferometer with a quadrature detector system
TL;DR: Here it is shown that the cyclic error correction method can be applied in real time and obtained 0.04-nm cyclic errors, with a standard deviation above 5 microm.
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Removing nonlinearity of a homodyne interferometer by adjusting the gains of its quadrature detector systems.
TL;DR: It is shown that nonlinearity can be reduced to an order of 0.01 nm when the detector gains are adjusted by simulation to include the optical characteristics.
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Reliability of parameters of associated base straight line in step height samples: Uncertainty evaluation in step height measurements using nanometrological AFM
Ichiko Misumi,Satoshi Gonda,Tomizo Kurosawa,Yasushi Azuma,Toshiyuki Fujimoto,Isao Kojima,Toshihisa Sakurai,Tadahiro Ohmi,Kiyoshi Takamasu +8 more
TL;DR: In this paper, a step height measurement of micropatterned thin films (10, 7, 5, and 3 nm) using an atomic force microscope (AFM) equipped with a three-axis laser interferometer (nanometrological AFM) and evaluated the uncertainty in these measurements.