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Tomoaki Nakamura

Researcher at Kyoto University

Publications -  43
Citations -  1409

Tomoaki Nakamura is an academic researcher from Kyoto University. The author has contributed to research in topics: Catalysis & Triethylborane. The author has an hindex of 15, co-authored 43 publications receiving 1330 citations. Previous affiliations of Tomoaki Nakamura include Tokyo University of Science & Hiroshima University.

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Cobalt-catalyzed Heck-type reaction of alkyl halides with styrenes.

TL;DR: A cobalt complex, CoCl2[1,6-bis(diphenylphosphino)hexane], catalyzes an alkylation reaction of styrenes in the presence of Me3SiCH2MgCl in ether to yield beta-alkylstyrenes.
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Powerful solvent effect of water in radical reaction: Triethylborane-induced atom-transfer radical cyclization in water

TL;DR: In this paper, a triethylborane-induced atom-transfer radical cyclization of allyl iodoacetate (3a) is described and the remarkable solvent effect of water was observed in this reaction.
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Cobalt-Catalyzed Trimethylsilylmethylmagnesium-Promoted Radical Alkenylation of Alkyl Halides: A Complement to the Heck Reaction

TL;DR: Crystallographic and spectroscopic investigations on cobalt complexes reveal that the reaction would begin with single electron transfer from an electron-rich (diphosphine)bis(trimethylsilylmethyl)cobalt(II) complex followed by reductive elimination to yield 1,2-bis(diphenylphosphino)ethane and a (d PH2) complex.
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Remote asymmetric induction with vinylketene silyl n,o-acetal.

TL;DR: The present vinylogous Mukaiyama aldol reaction provides a unique and effective means of controlling remote asymmetric induction and can provide a one-step construction of delta-hydroxy- alpha,gamma-dimethyl-alpha,beta-unsaturated carbonyl unit that is seen in many natural polyketide products.
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Functionalization on Silica Gel with Allylsilanes. A New Method of Covalent Attachment of Organic Functional Groups on Silica Gel

TL;DR: Treatment of an (allyl)organosilane with silica gel in refluxing toluene brought about deallylation forming an Si-O-Si bond with the silicon on thesilica gel, providing a new reliable method for the functionalization of a silica Gel surface.