Warren K. Waskiewicz

TL;DR: In this article, a method and apparatus for controlling beam emittance by placing a quadrupole lens array in a drift space of an illumination system component was proposed, which can permit independent control of beam current and beam emission, which is beneficial in a Scalpel illumination system.

TL;DR: In this paper, a process for controlling the stress of multilayer films formed on a substrate is disclosed, where a plurality of periods, each period having at least two layers of material wherein one of the layers is under compressive stress and the other layer of material is under tensile stress, are formed in a substrate.

TL;DR: In this paper, a method for repairing an optical system of the kind described above, in which the optical element comprises a substrate having a principal surface, a layer of chromium overlying the principal surface and a first layer of iridium overlying a chromium layer, was proposed.

TL;DR: A SCALPEL\circledR (SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology as mentioned in this paper.

TL;DR: In this article, a background dose proximity effect correction procedure is proposed that utilizes the unique way image contrast is formed in scattering with angular limitation projection electron lithography (SCALPEL(R)).