J
James Alexander Liddle
Researcher at National Institute of Standards and Technology
Publications - 162
Citations - 2700
James Alexander Liddle is an academic researcher from National Institute of Standards and Technology. The author has contributed to research in topics: Lithography & Electron-beam lithography. The author has an hindex of 26, co-authored 162 publications receiving 2584 citations. Previous affiliations of James Alexander Liddle include Bell Labs & Nokia.
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Journal ArticleDOI
Low-cost, low-loss microlens arrays fabricated by soft-lithography replication process
Madanagopal V. Kunnavakkam,F. M. Houlihan,M. Schlax,James Alexander Liddle,Paul Kolodner,Omkaram Nalamasu,John A. Rogers +6 more
TL;DR: In this article, a soft lithographic approach for fabricating low-cost, low-loss microlens arrays is described, where an accurate negative reproduction (stamp) of an existing high-quality lens surface (master) is made by thermally curing a prepolymer to a silicone elastomer against the master.
Journal ArticleDOI
One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography
Wei Wu,Gun Young Jung,Deirdre L. Olynick,Joseph Straznicky,Zhiyong Li,Xuema Li,Douglas A. A. Ohlberg,Yong Chen,S.Y. Wang,James Alexander Liddle,William M. Tong,R. Stanley Williams +11 more
TL;DR: In this paper, a process to fabricate a cross-bar structure using UV-curable nanoimprint lithography with a double-layer spin-on resist, metal lift off and Langmuir-Blodgett film deposition was developed.
Journal ArticleDOI
Solid state quantum computer development in silicon with single ion implantation
Thomas Schenkel,Arun Persaud,S. J. Park,Joakim Nilsson,Jeffrey Bokor,James Alexander Liddle,R. Keller,D. H. Schneider,D.W. Cheng,D. E. Humphries +9 more
TL;DR: In this paper, the authors describe single atom doping strategies and the status of single atom qubit arrays integrated with control gates and readout structures in a top-down approach, and discuss requirements for 31P qubit array formation by single ion implantation, and integration with semiconductor processing.
Journal ArticleDOI
Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light
Georgiy O. Vaschenko,C. Brewer,F. Brizuela,Yong Wang,Miguel A. Larotonda,Bradley M. Luther,Mario C. Marconi,Jorge J. Rocca,Carmen S. Menoni,E. H. Anderson,W. Chao,B. Harteneck,James Alexander Liddle,Yongmin Liu,David Attwood +14 more
TL;DR: These results open a gateway to the development of compact and widely available extreme-ultraviolet imaging tools capable of inspecting samples in a variety of environments with a 15-20 nm spatial resolution and a picosecond time resolution.
Proceedings ArticleDOI
Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic
Patrick P. Naulleau,Kenneth A. Goldberg,Erik H. Anderson,Kevin Bradley,Rene Delano,Paul Denham,Bob Gunion,Bruce Harteneck,Brian Hoef,Hanjing Huang,Keith Jackson,Gideon Jones,Drew Kemp,James Alexander Liddle,Ron Oort,Al Rawlins,Senajith Rekawa,Farhad Salmassi,Ron Tackaberry,C. Chung,Layton C. Hale,D. W. Phillion,Gary E. Sommargren,John S. Taylor +23 more
TL;DR: In this paper, the Sematech Set-2 Micro Exposure Tool (MET) has been used for developmental micro-field printing at the Advanced Light Source (ALS) at Lawrence Berkeley National Laboratory.