Showing papers by "Werner Wesch published in 2011"

Radiation damage formation and annealing in GaN and ZnO

Abstract: The radiation damage formation upon low temperature ion implantation and neutron irradiation has been compared for GaN and ZnO. Both materials exhibit strong dynamic annealing effects during implantation, even at 15 K, leading to high amorphisation thresholds. The damage build-up with fluence was found to proceed in a similar way for GaN and ZnO, both showing two saturation regimes below the amorphisation level where, over wide fluence regions, the damage level increases only very slowly. For low fluences the damage accumulation rate is similar for both materials. For higher fluences, on the other hand, GaN shows considerably higher damage levels and finally collapses into an amorphous structure while ZnO remains single crystalline up to the highest fluence of 7×10 16 Ar/cm 2 . Neutron irradiation produces similar defects as ion implantation but within the entire sample while the defect density is much lower. The main effect of irradiation on the structural properties of GaN is an expansion of the c-lattice parameter. Optical properties are significantly deteriorated after irradiation and only recover partially after annealing. ZnO does not suffer such a pronounced change of the lattice parameters but reveals a strong deterioration of the surface, possibly due to blistering and exfoliation. At the same time the optical properties are less affected than for GaN. The near band edge emission is partly quenched but recovers to a large extend after annealing while broad defect bands are observed below the bandgap for irradiated samples, before and after annealing.

Structural modifications of low-energy heavy-ion irradiated germanium

Abstract: Heavy-ion irradiation of crystalline germanium (c-Ge) results in the formation of a homogeneous amorphous germanium (a-Ge) layer at the surface. This a-Ge layer undergoes structural modification such as a strong volume expansion accompanied by drastic surface blackening with further ion irradiation. In the present paper we investigate the mechanism of this ion-induced structural modification in a-Ge basically for the irradiation with I ions (3 and 9 MeV) at room and low temperature as a function of ion fluence for the ion incidence angles of $\ensuremath{\Theta}={7}^{\ensuremath{\circ}}$ and $\ensuremath{\Theta}={45}^{\ensuremath{\circ}}$. For comparison, Ag- and Au-ion irradiations were performed at room temperature as a function of the ion fluence. At fluences two orders of magnitude above the amorphization threshold, morphological changes were observed for all irradiation conditions used. Over a wide range of ion fluences we demonstrate that the volume expansion is caused by the formation of voids at the surface and in the depth of the projected ion range. At high ion fluences the amorphous layer transforms into a porous structure as established by cross section and plan view electron microscopy investigations. However, the formation depth of the surface and buried voids as well as the shape and the dimension of the final porous structure depend on the ion fluence, ion species, and irradiation temperature and will be discussed in detail. The rate of the volume expansion (i.e., porous layer formation) depends linearly on the value of ${\ensuremath{\epsilon}}_{n}$. This clearly demonstrates that the structural changes are determined solely by the nuclear energy deposited within the amorphous phase. In addition, at high ion fluences all perpendicular ion irradiations lead to a formation of a microstructure at the surface, whereas for nonperpendicular ion irradiations a nonsaturating irreversible plastic deformation (ion hammering) without a microstructure formation is observed. For the irradiation with ion energies of several MeV, the effect of plastic deformation shows a linear dependence on the ion fluence. Based on these results, we provide an explanation for the differences in surface morphology observed for different angles of incidence of the ion beam will be discussed in detail.

Influence of electronic energy deposition on the structural modification of swift heavy-ion-irradiated amorphous germanium layers

Abstract: Swift heavy-ion (SHI) irradiation of amorphous germanium (a-Ge) layers leads to a strong volume expansion accompanied by a nonsaturating irreversible plastic deformation (ion hammering), which are consequences of the high local electronic energy deposition within the region of the a-Ge layer. We present a detailed study of the influence of SHI irradiation parameters on the effect of plastic deformation and structural modification. Specially prepared a-Ge layers were irradiated using two SHI energies and different angles of incidence, thus resulting in a variation of the electronic energy deposition per depth ${\ensuremath{\epsilon}}_{e}$ between 14.0 and 38.6 keV nm${}^{\ensuremath{-}1}$. For all irradiation parameters used a strong swelling of the irradiated material was observed, which is caused by the formation and growth of randomly distributed voids, leading to a gradual transformation of the amorphous layer into a sponge-like porous structure as established by cross-section scanning electron microscopy investigations. The swelling depends linearly on the ion fluence and on the value of ${\ensuremath{\epsilon}}_{e}$, thus clearly demonstrating that the structural changes are determined solely by the electronic energy deposited within the amorphous layer. Plastic deformation shows a superlinear dependence on the ion fluence due to the simultaneous volume expansion. This influence of structural modification on plastic deformation is described by a simple approach, thus allowing estimation of the deformation yield. With these results the threshold values of the electronic energy deposition for the onset of both structural modification and plastic deformation due to SHI irradiation are determined. Furthermore, based on these results, the longstanding question concerning the reason for the structural modification observed in SHI-irradiated crystalline Ge is answered.

Void formation in amorphous germanium due to high electronic energy deposition

Abstract: The effect of high electronic energy deposition in amorphous germanium has been studied experimentally by Au irradiation with ion energies of up to 185 MeV and different angles of incidence and by molecular dynamics computer simulations. In both cases, the energy deposition leads to void formation accompanied by strong swelling of the amorphous germanium. The simulation results prove that the formation of the voids is mainly based on a shock wave mechanism and the swelling is determined by the competing processes of the formation and growth of voids on the one hand and the shrinking and annihilation of voids on the other hand. In full agreement between experiment and simulation, the amount of the swelling is a linear function of the total energy deposited into electronic processes and there exists a threshold value of the electronic energy loss per ion and depth for swelling. A comparison of the threshold values obtained by the experiment and the simulation suggests that approximately 20% of the energy deposited into electronic processes is converted into atomic motion.

Ion-beam-induced damage formation in CdTe

Abstract: Damage formation in 〈111〉- and 〈112〉-oriented CdTe single crystals irradiated at room temperature and 15 K with 270 keV Ar or 730 keV Sb ions was investigated in situ using Rutherford backscattering spectroscopy (RBS) in channeling configuration. Defect profiles were calculated from the RBS spectra using the computer code DICADA and additional energy-dependent RBS measurements were performed to identify the type of defects. At both temperatures no formation of a buried amorphous layer was detected even after prolonged irradiation with several 1016 ions/cm2. The fact that CdTe is not rendered amorphous even at 15 K suggests that the high resistance to amorphization is caused by the high ionicity of CdTe rather than thermal effects. The calculated defect profiles show the formation of a broad defect distribution that extends much deeper into the crystal than the projected range of the implanted ions at both temperatures. The post-range defects in CdTe thus do not seem to be of thermal origin either, but are...

Structure and Optical Properties of Silicon Layers with GaSb Nanocrystals Created by Ion-Beam Synthesis

Abstract: We have studied the ion-beam synthesis of GaSb nanocrystals in Si by high-fluence “hot” implantation of Sb and Ga ions followed by thermal annealing. The Rutherford backscattering, transmission electron microscopy/ transmission electron diffraction, Raman spectroscopy and photoluminescence were used to characterize the implanted layers. It was found that the nanocrystal size increases from 5 to 60 nm in the samples annealed at 900 ◦C up to 20–90 nm in those annealed at 1100 ◦C. For the samples annealed at 900 ◦C a broad band in the region of 0.75–1.05 eV is registered in the photoluminescence spectra. The nature of this photoluminescence band is discussed.