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William J. Durand
Researcher at University of Texas at Austin
Publications - 23
Citations - 1866
William J. Durand is an academic researcher from University of Texas at Austin. The author has contributed to research in topics: Copolymer & Thin film. The author has an hindex of 14, co-authored 23 publications receiving 1635 citations. Previous affiliations of William J. Durand include Stanford University & University of Texas System.
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Journal ArticleDOI
The importance of surface morphology in controlling the selectivity of polycrystalline copper for CO2 electroreduction
Wei Tang,Andrew A. Peterson,Ana Sofia Varela,Zarko P. Jovanov,Lone Bech,William J. Durand,Søren Dahl,Jens K. Nørskov,Ib Chorkendorff +8 more
TL;DR: It is found that a copper nanoparticle covered electrode shows better selectivity towards hydrocarbons compared with the two other studied surfaces, an electropolished copper electrode and an argon sputtered copper electrode.
Journal ArticleDOI
Structure effects on the energetics of the electrochemical reduction of CO2 by copper surfaces
William J. Durand,Andrew A. Peterson,Andrew A. Peterson,Felix Studt,Frank Abild-Pedersen,Jens K. Nørskov,Jens K. Nørskov +6 more
TL;DR: In this article, the effects of the nanostructure of the copper surface and compare the effect of the fcc(111, fcc (100) and fcc-211) facets of copper on the energetics of the electroreduction of CO 2.
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Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains.
Christopher M. Bates,Takehiro Seshimo,Michael J. Maher,William J. Durand,Julia D. Cushen,Leon M. Dean,Gregory Blachut,Christopher J. Ellison,C. Grant Willson +8 more
TL;DR: A water-soluble polymer is developed that can top-coat lamellaforming block copolymers and that transforms during thermal annealing into a neutral wetting layer that helps drive the formation of vertically oriented lamellae.
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Design of high‐χ block copolymers for lithography
William J. Durand,Gregory Blachut,Michael J. Maher,Stephen M. Sirard,Summer Tein,Matthew C. Carlson,Yusuke Asano,Sunshine X. Zhou,Lane Austin,Christopher M. Bates,Christopher J. Ellison,C. Grant Willson +11 more
TL;DR: In this article, the authors describe the design and synthesis of a series of lamella-forming, silicon-containing block copolymers (Si-BCPs) and evaluation of these materials as potential candidates for lithographic applications.
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Interfacial Design for Block Copolymer Thin Films
Michael J. Maher,Christopher M. Bates,Gregory Blachut,Stephen M. Sirard,Jeffrey L. Self,Matthew C. Carlson,Leon M. Dean,Julia D. Cushen,William J. Durand,Colin O. Hayes,Christopher J. Ellison,C. Grant Willson +11 more
TL;DR: In this article, top coat design, coating, and optimization methodologies are introduced that facilitate the synthesis, application, and identification of neutral top coats for block copolymer (BP) thin films.