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Xavier Mellhaoui
Researcher at University of Orléans
Publications - 6
Citations - 343
Xavier Mellhaoui is an academic researcher from University of Orléans. The author has contributed to research in topics: Etching (microfabrication) & Passivation. The author has an hindex of 5, co-authored 6 publications receiving 316 citations.
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Journal ArticleDOI
Passivation mechanisms in cryogenic SF6/O2 etching process
Remi Dussart,Mohamed Boufnichel,G. Marcos,Philippe Lefaucheux,A Basillais,R Benoit,Thomas Tillocher,Xavier Mellhaoui,H Estrade-Szwarckopf,Pierre Ranson +9 more
TL;DR: In this paper, the passivating layer is removed during the increase of the wafer chuck temperature leading to a very clean surface of the sidewalls after processing, and a two-step process is defined to rebuild the passivation layer after its destruction and continue the trench etching.
Journal ArticleDOI
SiOxFy passivation layer in silicon cryoetching
Xavier Mellhaoui,Remi Dussart,Thomas Tillocher,Philippe Lefaucheux,Pierre Ranson,Mohamed Boufnichel,Lawrence J. Overzet +6 more
TL;DR: In this paper, the SiOxFy passivation layer created on structure sidewalls during silicon cryoetching is investigated and two physical mechanisms are proposed to explain the SiO2 passivati...
Journal ArticleDOI
Silicon columnar microstructures induced by an SF6/O2 plasma
Remi Dussart,Xavier Mellhaoui,Thomas Tillocher,Philippe Lefaucheux,M Volatier,C Socquet-Clerc,Pascal Brault,Pierre Ranson +7 more
TL;DR: An inductively coupled SF6/O2 plasma is used to form a columnar microstructure (CMS) on silicon samples cooled at very low temperature (~ −100°C).
Journal ArticleDOI
Oxidation threshold in silicon etching at cryogenic temperatures
Thomas Tillocher,Remi Dussart,Xavier Mellhaoui,Philippe Lefaucheux,N. Mekkakia Maaza,Pierre Ranson,Mohamed Boufnichel,Lawrence J. Overzet +7 more
TL;DR: In this article, a mass spectrometry study of the oxidation threshold in silicon etching in SF6∕O2 plasmas is presented, and the presence of the threshold is clearly evident in the signals of many ions, for example, SiF3+, F+, and SOF2+.
Journal ArticleDOI
Two Cryogenic Processes Involving SF6, O2, and SiF4 for Silicon Deep Etching
Thomas Tillocher,Remi Dussart,Lawrence J. Overzet,Xavier Mellhaoui,Philippe Lefaucheux,Mohamed Boufnichel,Pierre Ranson +6 more
TL;DR: In this paper, two types of silicon cryoetching processes are proposed: the first one consists of alternating SF 6 plasma isotropic etching steps and SiF 4 /O 2 passivation steps at low temperature of the silicon substrate.