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Xinbo Yang
Researcher at Soochow University (Suzhou)
Publications - 75
Citations - 2729
Xinbo Yang is an academic researcher from Soochow University (Suzhou). The author has contributed to research in topics: Silicon & Crystalline silicon. The author has an hindex of 19, co-authored 75 publications receiving 1769 citations. Previous affiliations of Xinbo Yang include Chinese Academy of Sciences & King Abdullah University of Science and Technology.
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Stabilizing and activating dopants in ⟨112⟩ silicon nanowires by alkene adsorptions: A first-principles study
TL;DR: In this paper, the B dopant stability and doping level tunability of silicon nanowires with alkene adsorption were revealed based on first-principles calculations.
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Thermal and mechanical properties of novel substrate crystal Mg0.4Al2.4O4
TL;DR: In this article, a single crystal Mg0.4Al2.4O4 was grown by the Czochralski method and the measured specific heat values are 0.804-1.06-J g−−1 K−1 in the temperature range from 298.15 to 573.15 K. The Vickers microhardness values are 1328-1414 kg mm−2.
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Ion-Implanted Laser-Annealed p + and n + Regions: A Potential Solution for Industrially Feasible High-Efficiency N-Type Interdigitated Back-Contact Solar Cells
TL;DR: In this article, a method consisting of laser annealing and a subsequent low-temperature oxidation (LA&OX) has been developed to co-anneal boron implanted and phosphorus implanted regions by a single step.
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Edge-Defined, Film-Fed Growth (EFG) Technique for the Preparation of α-Al2O3:C Crystal with Highly Sensitive Thermoluminescence Response
TL;DR: In this paper, the alpha-Al2O3:C, a highly sensitive thermoluminescence dosimetry crystal, was grown by the EFG method in which a graphite heating unit and shield acted as the carbon source during the growth process.
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The Impact of SiO $_{2}$ /SiN $_{\rm x}$ Stack Thickness on Laser Doping of Silicon Solar Cell
TL;DR: In this article, the impact of the SiNx layer thickness in the SiO2/SiNx stacks on the properties of laser doped lines is investigated through resistance measurements of the laser line and the silicon-metal contact and the doping profile near the edge of the dielectric window.