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Yanfei Qi
Researcher at Xi'an Jiaotong-Liverpool University
Publications - 18
Citations - 292
Yanfei Qi is an academic researcher from Xi'an Jiaotong-Liverpool University. The author has contributed to research in topics: Resistive random-access memory & Dielectric. The author has an hindex of 8, co-authored 18 publications receiving 133 citations. Previous affiliations of Yanfei Qi include Xi'an Jiaotong University.
Papers
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Journal ArticleDOI
Advances of RRAM Devices: Resistive Switching Mechanisms, Materials and Bionic Synaptic Application.
Zongjie Shen,Zongjie Shen,Chun Zhao,Chun Zhao,Yanfei Qi,Yanfei Qi,Wangying Xu,Yina Liu,Ivona Z. Mitrovic,Li Yang,Cezhou Zhao,Cezhou Zhao +11 more
TL;DR: The bionic synaptic application of RRAM devices is under intensive consideration, its main characteristics such as potentiation/depression response, short-/long-term plasticity (STP/LTP), transition from short- term memory to long-term memory (STM to LTM) and spike-time-dependent plasticity(STDP) reveal the great potential of R RAM devices in the field of neuromorphic application.
Journal ArticleDOI
Memristive Non-Volatile Memory Based on Graphene Materials.
Zongjie Shen,Chun Zhao,Yanfei Qi,Ivona Z. Mitrovic,Li Yang,Jiacheng Wen,Huang Yanbo,Puzhuo Li,Cezhou Zhao +8 more
TL;DR: An overview of GRM-based RRAM devices is provided, with discussion about the properties of GRMs, main operation mechanisms for resistive switching (RS) behavior, figure of merit (FoM) summary, and prospect extension ofGRM- based R RAM devices.
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Effect of annealing temperature for Ni/AlOx/Pt RRAM devices fabricated with solution-based dielectric
Zongjie Shen,Yanfei Qi,Ivona Z. Mitrovic,Cezhou Zhao,Steve Hall,Li Yang,Luo Tian,Huang Yanbo,Chun Zhao +8 more
TL;DR: The annealing temperature of 250 °C was found to be optimal for the dielectric layer, exhibiting superior performance of the RRAM devices with the lowest operation voltage, the highest ON/OFF ratio, the narrowest resistance distribution, the longest retention time and the most endurance cycles.
Journal ArticleDOI
Effect of electrode area on resistive switching behavior in translucent solution-processed AlOx based memory device
TL;DR: A translucent resistance random access memory (RRAM) with Ag/AlOx/indium tin oxide (ITO) stack grown on a glass substrate was investigated through a systematic and comprehensive investigation as discussed by the authors.
Journal ArticleDOI
Resistive switching behavior of solution-processed AlOx and GO based RRAM at low temperature
Yanfei Qi,Yanfei Qi,Zongjie Shen,Zongjie Shen,Chun Zhao,Chun Zhao,Ivona Z. Mitrovic,Wangying Xu,Eng Gee Lim,Eng Gee Lim,Li Yang,Li Yang,Jiahuan He,Jiahuan He,T. Luo,T. Luo,Y.B. Huang,Y.B. Huang,Cezhou Zhao +18 more
TL;DR: In this article, a detailed study and comprehensive comparison in view of resistive switching performance has been conducted for aluminum oxide and graphene oxide (GO) dielectric films, including operation voltage, resistance distribution, resistance ratio, conduction mechanism and retention/endurance property.