Y
Yurii Victorovitch Sidelnikov
Researcher at Carl Zeiss AG
Publications - 5
Citations - 458
Yurii Victorovitch Sidelnikov is an academic researcher from Carl Zeiss AG. The author has contributed to research in topics: STRIPS & FOIL method. The author has an hindex of 2, co-authored 5 publications receiving 458 citations. Previous affiliations of Yurii Victorovitch Sidelnikov include ASML Holding.
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Patent
Lithographic apparatus, and device manufacturing method
Maarten Marinus Johannes Wilhelmus Van Herpen,Vadim Yevgenyevich Banine,Johannes Peterus Henricus De Kuster,Johannes Hubertus Josephina Moors,Lucas Henricus Johannes Stevens,Bastiaan Theodoor Wolschrijn,Yurii Victorovitch Sidelnikov,Marc Hubertus Lorenz Van Der Velden,Wouter Anthon Soer,Thomas Stein,K Kurt Gielissen +10 more
TL;DR: In this article, a lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is described, which includes a first radiation dose detector and a second radiation dose detectors, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux.
Patent
Lithographic apparatus, radiation system and device manufacturing method
Robert Rafilevitch Gayazov,Vadim Yevgenyevich Banine,Vladimir Vitalevitch Ivanov,Evgenii Dmitreevitch Korob,Konstantin Nikolaevitch Koshelev,Givi Georgievitch Zukavishvili,Yurii Victorovitch Sidelnikov +6 more
TL;DR: In this paper, a foil trap is located in a path of a radiation beam, and a voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips.
Journal ArticleDOI
Gated pinhole camera imaging of the high-energy ions emitted by a discharge produced Sn plasma for extreme ultraviolet generation
K Kurt Gielissen,Yurii Victorovitch Sidelnikov,Denis Alexandrovich Glushkov,Wouter Anthon Soer,Vadim Yevgenyevich Banine,J. J. A. M. v. d. Mullen +5 more
TL;DR: In this article, the origin and nature of high-energy ions emitted by a discharge produced plasma source were studied using gated pinhole camera imaging, and it was shown that this consists mainly of oxygen ions emitted from a region near the cathode.
Patent
Lithography equipment, radiation system, and device manufacturing method
Vadim Yevgenyevich Banine,Robert Rafilevitch Gayazov,Vladimir Vitalevitch Ivanov,Evgenii Dmitreevitch Korob,Konstantin Nikolaevitch Koshelev,Yurii Victorovitch Sidelnikov,Givi Georgievitch Zukavishvili,ビターレビッチ イワノフ,ウラジミール,ドミトリービッチ コロブ エフゲニー,ニコラエビッチ コシェレフ コンスタンチン,ゲオルギエビッチ ツカヴィッシュビリ ジビ,イェフゲンイェビッチ バニーネ ファディム,ビクトロビッチ シデルニコフ ユーリー,ラフィルビッチ ガヤツォフ ロバート +13 more
TL;DR: In this article, a wheel trap is arranged in a path of the radiant beam, and a voltage-applying circuit is connected to the strips 34 to apply a voltage difference between adjoining strip couples of the wheel trap.
Patent
Apparatus with plasma radiation source and method of forming a beam of radiation
Vladimir Mihailovitch Krivtsun,Vadim Yevgenyevich Banine,Vladimir Vitalevich Ivanov,Evgeny Dmitrievich Korop,K. N. Koshelev,Yurii Victorovitch Sidelnikov,O. F. Yakushev +6 more
TL;DR: In this paper, an electrical potential application circuit is constructed and arranged to apply an electric potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by a plasma radiation ion to the foil.