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Zhiqi Liu

Researcher at Beihang University

Publications -  108
Citations -  4224

Zhiqi Liu is an academic researcher from Beihang University. The author has contributed to research in topics: Spintronics & Antiferromagnetism. The author has an hindex of 29, co-authored 98 publications receiving 3329 citations. Previous affiliations of Zhiqi Liu include Chinese Academy of Sciences & University of Pittsburgh.

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Formation of the yttrium/germanium interface: Fermi-level pinning and intermixing at room temperature

TL;DR: In this article, a systematic in situ coverage dependent study is conducted to study the Schottky barrier evolution and chemical reactions at the yttrium/germanium interface and the implications of their findings on device performance are discussed.
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Noncollinear Mn3Sn for Antiferromagnetic Spintronics

TL;DR: In this article , the authors comprehensively summarize various exotic spintronic properties of Mn3Sn, such as the anomalous Hall effect, anomalous Nernst effect, the topological Hall effect and spin Hall effect.
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Noncollinear Antiferromagnetic Spintronics

TL;DR: In this article , the authors review the recent progress in the emerging non-collinear antiferromagnetic spintronics from fundamental physics to device applications and discuss current challenges and future research directions for this field.
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Antiferromagnetic structure of exchange-coupled L a 0.7 S r 0.3 Fe O 3 thin films studied using angle-dependent x-ray absorption spectroscopy

TL;DR: In this article, the magnetic structure of exchange-coupled antiferromagnetic (AF) layers in epitaxial superlattices grown on (111)-oriented substrates was studied using angle-dependent x-ray absorption spectroscopy utilizing linearly polarized x rays.
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Band gap, band offsets and dielectric constant improvement by addition of yttrium into lanthanum aluminate

TL;DR: In this article, the effects of adding yttrium (Y) in bulk lanthanum aluminate (LaAlO3 or LAO) was studied by investigating the quaternary compound oxide La0.3Y0.7 AlO3 (LYAO), on silicon (Si) and found that the inclusion of Y to LAO increases the band gap by 0.9 eV without compromising the dielectric constant.