Book ChapterDOI
Determination of Layer Thicknesses of Single Layers and Multilayers
Ullrich Pietsch,Václav Holý,Tilo Baumbach +2 more
- pp 143-178
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TLDR
In this article, the thickness of a thin layer can be determined from the angular positions of the subsidiary maxima on the reflection (or diffraction) curves, which can be solved both by X-ray reflection and x-ray diffraction.Abstract:
The measurement of layer thickness is a basic problem, and can be solved both by x-ray reflection and x-ray diffraction (see [121] for a review). In both methods, the thickness of a thin layer can be determined from the angular positions of the subsidiary maxima on the reflection (or diffraction) curves.read more
Citations
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Journal ArticleDOI
Copper oxide coatings deposited by reactive radio-frequency sputtering for solar absorber applications
TL;DR: In this article , the authors used reactive radio-frequency sputtering of a copper target in argon-oxygen atmospheres to obtain submicron copper oxide coatings on glass and copper substrates.
Proceedings ArticleDOI
Physical and chemical characterization of ultra low-k SiCOH films by X-ray reflectometry and GISAXS
Danilo Roque Huanca,Patrick Verdonck,Veronica Christiano,G. Kellerman,Sebastião G. Dos Santos Filho +4 more
TL;DR: In this paper, the results indicate that plasma treatment leads to the formation of a thin dense layer onto the surface of the ALK films and yields the reduction of the total thickness as consequence of the pore sealing effect.
Proceedings ArticleDOI
Characterization of the semi-insulating properties of Al 2 O 3 and AlHfO 3 .5 for power devices
TL;DR: Physical and electrical characterization of alumina and hafnium aluminates gate dielectrics were carried out to investigate their semi-insulating characteristics as passivating layer for power devices as discussed by the authors.
Journal ArticleDOI
Characterization of the semi-insulating properties of AlHfO3.5 for power devices
TL;DR: Physical and electrical characterization of hafnium aluminates gate dielectrics was carried out in this paper, where the deposited films were annealed in pure nitrogen to simulate the thermal budget during a conventional CMOS processing.
Proceedings ArticleDOI
Electromagnetic solution for scattering from 2D rough surfaces through general solutions for 1D rough surfaces in short waves
TL;DR: In this paper, the electromagnetic solution of scattering from 2D rough surfaces in short waves using boundary integral equations for conical diffraction and Monte Carlo simulations is reported, and the general equivalence rule for determination of the efficiencies of reflected orders of bi-gratings from those calculated for classical gratings is derived.