Patent
Diamond films and methods for manufacturing diamond films
TLDR
In this paper, the integrated intensity ratio of the diamond films, CL1 /CL2, is equal or greater than 1/20, where CL1 is defined as the intensity of the emission band in the wavelength region shorter than 300 nm while CL2 is the intensity from 300 nm to 800 nm.Abstract:
Diamond films and novel method to grow the diamond films can improve the performance of products utilizing diamond films. In the cathodoluminescence taken at room temperature, the integrated intensity ratio of the diamond films, CL1 /CL2, is equal or greater than 1/20, where CL1 is the integrated intensity of the emission band in the wavelength region shorter than 300 nm while CL2 is the integrated intensity of the emission band in the wavelength region from 300 nm to 800 nm. Such high quality diamond films with intensive coalescence on the surface can be obtained by deposition on the substrates or films, made of at least one member selected from the group consisting of platinum, platinum alloys, iridium, iridium alloys, nickel, nickel alloys, silicon, and metal silicides.read more
Citations
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References
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Patent
Method of forming a boron-doped diamond film by chemical vapor deposition
TL;DR: A method of forming boron-doped diamond film by, chemical vapor deposition (CVD) utilizing two-component system reactant gas doped with trimethyl borate is described in this article.
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Distinguishing natural from synthetic diamond
TL;DR: In this article, a simple, safe and compact apparatus for distinguishing natural colourless or near-colourless diamond from synthetic diamond is presented, in which a flash lamp irradiates a stationary diamond with irradiation which has a substantial component of ultraviolet light below 250 nm or 225 nm.
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High growth rate homoepitaxial diamond film deposition at high temperatures by microwave plasma-assisted chemical vapor deposition
TL;DR: In this paper, the authors reported the deposition of high quality diamond films at high linear growth rates and substrate temperatures for microwave-plasma chemical vapor deposition (MPCVD) processes.
Patent
Methods for manufacturing monocrystalline diamond films
Yoshihiro Shintani,Takeshi Tachibana,Kozo Nishimura,Koichi Miyata,Yoshihiro Yokota,Koji Kobashi +5 more
TL;DR: In this paper, a method is related to grow monocrystalline diamond films by chemical vapor deposition on a large area at low cost, where the substrate materials are either bulk single crystals of Pt or its alloys, or thin films of those materials deposited on suitable supporting materials.