Patent
Semiconductor thin film and semiconductor device
Reads0
Chats0
TLDR
In this paper, an amorphous semiconductor thin film is crystallized by utilizing a catalyst element, the catalyst element is removed by performing a heat treatment in an atmosphere containing a halogen element.Abstract:
After an amorphous semiconductor thin film is crystallized by utilizing a catalyst element, the catalyst element is removed by performing a heat treatment in an atmosphere containing a halogen element. A resulting crystalline semiconductor thin film exhibits {110} orientation. Since individual crystal grains have approximately equal orientation, the crystalline semiconductor thin film has substantially no grain boundaries and has such crystallinity as to be considered a single crystal or considered so substantially.read more
Citations
More filters
Patent
Semiconductor device, and manufacturing method thereof
TL;DR: In this article, the oxide semiconductor film has at least a crystallized region in a channel region, which is defined as a region of interest (ROI) for a semiconductor device.
Patent
Light-emitting device and manufacturing method thereof
Shunpei Yamazaki,Yasuyuki Arai +1 more
TL;DR: In this article, a light-emitting element and a driver circuit of the light emitting element are provided over different substrates to prevent a point defect and a line defect in forming a light emitting device, thereby improving the yield.
Patent
Semiconductor Device and Method of Fabricating the Same
TL;DR: In this paper, an active matrix display (AMD) with pixel electrodes, gate wirings and source wires is proposed, in which pixel electrodes are arranged in the pixel portions to realize a high numerical aperture without increasing the number of masks or the amount of steps.
Patent
Liquid crystal display device and method of manufacturing the same
TL;DR: A liquid crystal display device and a method of manufacturing the same can be found in this article, where a plurality of pixel cells on a substrate and a common voltage line are used.
Patent
Semiconductor display device
Shunpei Yamazaki,Jun Koyama +1 more
TL;DR: In this article, the luminance of the EL elements of each in the display pixels is controlled in accordance with the amount of electric current flowing in each of the diodes, which is a function of the environment.
References
More filters
Patent
Method for manufacturing a semiconductor device
TL;DR: In this paper, a semiconductor wafer of such structure that structures with a low mechanical strength, such as suspended microstructures, are exposed at a surface thereof, detachable adhesive sheet making up protective caps for the respective suspended micro structures are formed over the semiconductor Wafer.
Patent
TFT-el display panel using organic electroluminescent media
Ching Wan Tang,Biay Cheng Hseih +1 more
TL;DR: In this article, a flat panel display comprising thin-film transistor-electroluminescent (TFT-EL) pixels is described, and an addressing scheme incorporating two TFTs and a storage capacitor is used to enable the EL pixels on the panel to operate at a duty factor close to 100%.
Patent
Method for producing semiconductor device
Abstract: In producing a thin film transistor, after an amorphous silicon film is formed on a substrate, a nickel silicide layer is formed by spin coating with a solution (nickel acetate solution) containing nickel as the metal element which accelerates (promotes) the crystallization of silicon and by heat treating. The nickel silicide layer is selectively patterned to form island-like nickel silicide layer. The amorphous silicon film is patterned. A laser light is irradiated while moving the laser, so that crystal growth occurs from the region in which the nickel silicide layer is formed and a region equivalent to a single crystal (a monodomain region) is obtained.
Patent
A method of fabricating a TFT-EL pixel
Biay Cheng c,Chin Wan Tan +1 more
TL;DR: In this paper, a method of making a 4-terminal active matrix electroluminescent device that utilizes an organic material as the electrolumeinescent medium is described.
Patent
Manufacture of semiconductor
Ro Toshitami,Uenishi Toshimi,Wakabayashi Yuji,Ishiguro Takeshi,Takahashi Mikio,Fukui Masahiro,Tsuji Kazuhiko,Funakoshi Hisashi,Dansui Yoshitaka,Aoi Nobuo,Sakai Hiroko,Kawasaki Satoko +11 more
TL;DR: In this article, the authors proposed to reduce dusts under a ceiling of a carrier conveying space by so inclining the ceiling of the space in an apparatus for manufacturing semiconductor that its outside is lowered.