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Journal ArticleDOI

Simplified laser system for the generation of 60 fs pulses at 248 nm

Sándor Szatmári, +1 more
- 01 Oct 1988 - 
- Vol. 68, Iss: 3, pp 196-202
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TLDR
In this paper, a simplified hybrid excimer-dye laser system is described, capable of generating sub-picosecond pulses at most of the excimer laser wavelengths, and the effect of operational conditions of different parts of the system and of the compressor on the spectral and temporal characteristics of the output pulse is studied.
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This article is published in Optics Communications.The article was published on 1988-10-01. It has received 225 citations till now. The article focuses on the topics: Femtosecond pulse shaping & Bandwidth-limited pulse.

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Citations
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Journal ArticleDOI

Nanosecond and femtosecond excimer laser ablation of fused silica

TL;DR: Ablation of fused silica using standard excimer lasers (20-30 ns pulse duration at 193, 248, and 308 nm) and a short pulse laser system (500 fs at 248 nm) is reported in this article.
Journal ArticleDOI

High-efficiency dielectric reflection gratings: design, fabrication, and analysis.

TL;DR: Reflection gratings produced entirely of dielectric materials give the opportunity to enhance the laser damage threshold over that occurring in conventional metal gratings used for chirped-pulse-amplification, high-power lasers.
Journal ArticleDOI

Nanosecond and femtosecond excimer-laser ablation of oxide ceramics

TL;DR: In this paper, the behavior of various oxide ceramics (Al2O3, MgO, ZrO2) has been studied using different wavelengths (248 nm, 308 nm) and pulse durations (30 ns, 500 fs).
Journal ArticleDOI

Surface modifications induced by ns and sub-ps excimer laser pulses on titanium implant material

TL;DR: X-ray photoelectron spectroscopy analysis of the laser-polished titanium surface revealed that laser treatment led to a decrease of the surface contamination and in thickening of the oxide layer, which resulted in effective smoothing, as measured with atomic force microscope.
Journal ArticleDOI

Machining of submicron structures on metals and semiconductors by ultrashort UV-laser pulses

P. Simon, +1 more
- 01 Nov 1996 - 
TL;DR: Ablation of submicron structures on copper and silicon by short ultraviolet laser pulses (0.5-50 ps, 248 nm) is presented in this article. But the results of the ablation are limited.
References
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Journal ArticleDOI

Negative group-velocity dispersion using refraction

TL;DR: In this article, it was shown that a negative contribution to the group-velocity dispersion always accompanies angular dispersion and structures, such as slabs and prisms, that use this contribution to provide adjustable group velocity dispersion.
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Group velocity dispersion in prisms and its application to pulse compression and travelling-wave excitation

TL;DR: In this paper, a general expression relating the delay and the angular dispersion was found, and a pulse compressor equivalent to the Treacy-compressor, based on this delay was described.
Journal ArticleDOI

Hybrid dye-excimer laser system for the generation of 80 fs, 900 GW pulses at 248 nm

TL;DR: In this paper, the authors reported the generation of 80 fs pulses at 248 nm using a hybrid dye-excimer laser system, which were then amplified in a wide-aperture amplifier to 900 GW peak power.
Journal ArticleDOI

Subpicosecond KrF* excimer-laser source.

TL;DR: It is shown that efficient subpicosecond energy extraction is possible and the means of producing ultrashort seed pulses for the KrF* amplifier system and characteristics of the full system are described.
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