Patent
Step and repeat device
TLDR
In this paper, a multi-station step and repeat device (stepper) for forming the image of a semiconductor wafer is provided, where at least one of them is used for forming an image 108.Abstract:
PURPOSE: To provide a multi-station step and repeat device (stepper) for forming the image of a semiconductor wafer. CONSTITUTION: A stepper that has at least two stations 106 and 108 is provided, where at least one of them is used for forming an image 108. Stations other than those for forming an image can be used for measuring image field characteristics or correcting an image defect or cutting a phase shift mask(PSM) loop. A plurality of laser beams 120-134 that are directed in an orthogonally crossed direction provide monitoring by an interferometer and track a wafer position regarding a wafer on the stepper.read more
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Patent
Exposure apparatus and method
Kenji Nishi,Kazuya Ota +1 more
TL;DR: In this article, a projection exposure apparatus and method for illuminating a transfer pattern and forming an image upon a mask for exposure from the illumination light and transfer exposing the image of the pattern of the mask under illumination light is presented.
Patent
Lithographic apparatus, and device manufacturing method
Maarten Marinus Johannes Wilhelmus Van Herpen,Vadim Yevgenyevich Banine,Johannes Peterus Henricus De Kuster,Johannes Hubertus Josephina Moors,Lucas Henricus Johannes Stevens,Bastiaan Theodoor Wolschrijn,Yurii Victorovitch Sidelnikov,Marc Hubertus Lorenz Van Der Velden,Wouter Anthon Soer,Thomas Stein,K Kurt Gielissen +10 more
TL;DR: In this article, a lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is described, which includes a first radiation dose detector and a second radiation dose detectors, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux.
Patent
Projection exposure apparatus and method
TL;DR: In this paper, a scanning exposure apparatus and method employ a first masking member to define a width of an illumination area and a second masking members to change the illumination area during movement of a mask and a substrate relative to illumination light during scanning exposure.
Patent
Exposure apparatus and an exposure method
Kenji Nishi,Kazuya Ota +1 more
TL;DR: In this paper, a scanning exposure apparatus includes a projection system, a stage system, and a first detector and a control system, each of which is movable independently in a plane while holding a substrate.
Patent
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
TL;DR: In this paper, a transition from a first state to a second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under it is described.
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