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Proceedings ArticleDOI

The CCD flash gate

TLDR
In this article, preliminary findings are presented for a new approach that significantly improves the quantum efficiency of the current generation of high-performance, thinned, backside illuminated silicon CCDs.
Abstract
Preliminary findings are presented for a new approach that significantly improves the quantum efficiency of the current generation of high-performance, thinned, backside illuminated silicon CCDs. Experiments have shown that the application of a less than 4-micron thick layer of metal with high work function to the backside of the CCD can yield 100-percent internal quantum efficiency in the visible, UV, XUV and soft X-ray regions of the spectrum. Theory and solid state models describing the new technique (the 'CCD flash gate'), and a considerable amount of experimental data, are discussed. Specific recommendations for use of the flash gate in present and future CCDs are also reviewed.

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Patent

X-ray imaging system and solid state detector therefor

TL;DR: The x-ray imaging system in this paper comprises an x ray source for producing an xray beam having an energy of at least 30 kVp and an x-rays detector consisting a solid state integrated circuit having a silicon substrate and a plurality of charge storage devices.
Journal ArticleDOI

Charge-Coupled-Device Charge-Collection Efficiency And The Photon-Transfer Technique

TL;DR: In this article, the authors present a definition of CCE performance and introduce a standard test tool (the photon-transfer technique) for measuring and optimizing this important CCD parameter.
Proceedings ArticleDOI

Charge-Coupled Device Pinning Technologies

TL;DR: In this article, the authors describe the characteristics of the interface between these oxides and the photo-sensitive silicon and indicate the extent to which CCD performance (e.g. dark current, spectral response, charge collection efficiency, charge transfer efficiency, pixel-nonuniformity read noise full well capacity blooming residual image and vulnerability to ionizing radiation damage) depend* upon these interfacial characteristics.
Proceedings ArticleDOI

Fano-noise-limited CCDs

TL;DR: In this article, Fano-noise-limited test data is presented for two different CCD types and a CCD derived estimate of the Fano factor is determined by evaluating ultra low-modulation images (less than 1 electron peak-to-peak) it is shown that the CCD's global CTE is now superior to its read noise floor.
Patent

Low dose mammography system

TL;DR: In this paper, the x-ray detector is constructed as a PiN diode with the voltage bias direction parallel to the direction of incident radiation, and the detector signals are processed to provide a digital image of the tissue sample.
References
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Book

Microwave devices and circuits

TL;DR: In this article, the authors discuss the role of microwave devices and circuits in the development of wireless communication networks, and propose a framework for wireless communication between two wireless devices and their circuits.
Journal ArticleDOI

Calculation of surface generation and recombination velocities at the Si‐SiO2 interface

TL;DR: Using deep level transient spectroscopy in the current transient mode, the interface trap density and electron and hole capture cross sections have been measured for thermally oxidized 〈100〉 silicon.
Journal ArticleDOI

Formation of silicon oxide over gold layers on silicon substrates

TL;DR: In this article, a single-crystal substrate of silicon is covered with evaporated gold and heated at relatively low temperatures (100-300°C) in an oxidizing atmosphere, a silicon dioxide layer is readily formed over the gold layer.
Journal ArticleDOI

Defects in Si/SiO2 structures introduced by sputter metallization

TL;DR: In this article, a comparative study of MOS structures metallized in planar and cylindrical magnetron systems and in a conventional d.c. diode sputtering system was conducted.