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Three-dimensional memory array and method of fabrication

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TLDR
In this paper, a multi-level memory array employing rail-stacks is described, which include a conductor and semiconductor layers, separated by an insulating layer used to form antifuses.
Abstract
A multi-level memory array is described employing rail-stacks. The rail-stacks include a conductor and semiconductor layers. The rail-stacks are generally separated by an insulating layer used to form antifuses. In one embodiment, one-half the diode is located in one rail-stack and the other half in the other rail-stack.

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Citations
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References
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Patent

Vertically-stacked, field-programmable, nonvolatile memory and method of fabrication

TL;DR: In this article, a very high density field programmable memory (FPM) is described. And the array is formed vertically above a substrate using several layers, each layer of which includes vertically fabricated memory cells.
Patent

Programmable cell for use in programmable electronic arrays

TL;DR: An improved programmable cell for use in programmable electronic arrays such as PROM devices, logic arrays, gate arrays and die interconnect arrays is presented in this paper, where the cells have a highly nonconductive state settable and non-resettable into a highly conductive state.
Patent

Three-dimensional read-only memory

Guobiao Zhang
TL;DR: A read-only memory structure, having a three dimensional arrangement of memory elements, is described in this paper, where memory elements are partitioned into multiple memory levels and each memory level is stacked on top of another.
Patent

Programmable semiconductor structures and method for using the same

TL;DR: In this article, a programmable device can be made with semiconductor layers which form two series coupled back-to-back diodes, each of which can be selectively programmed to lose its rectifying feature.
Journal ArticleDOI

Three-dimensional IC trends

TL;DR: In this article, the authors proposed a 3D IC architecture with three active layers, and the technical issues for realizing practical 3-D IC, i.e., the technology for fabricating high-quality SOI crystal on complicated surface topology, crosstalk of the signals between the stacked layers, total power consumption and cooling of the chip, are discussed.