How to improve retention of nor flash memory?
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To improve the retention of NOR flash memory, several approaches have been proposed in the literature. One method involves controlling the thickness of the contact etch stop layer (CESL) to prevent charge loss . Another approach is the use of a selective 1-bit soft erase scheme, such as gate-induced drain leakage (GIDL), to remove shallowly trapped electrons after the program operation . Additionally, incorporating aluminum oxide (Al2O3) as a tunneling layer in the NOR flash array has shown promising results in improving retention characteristics . These methods aim to enhance the data retention performance of NOR flash memory and address issues related to charge loss and trapped electrons. By implementing these techniques, the threshold voltage window can be improved, leading to better retention over time.
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| Papers (5) | Insight |
|---|---|
| The retention of NOR flash memory can be improved by incorporating aluminum oxide (Al2O3) as a tunneling layer, which takes advantage of its higher permittivity and higher bandgap compared to other materials like SiO2 and silicon nitride (Si3N4). This improves the threshold voltage window after 10 years of programming and erasing (P/E). | |
03 Dec 2022 | The provided paper does not discuss the retention improvement of NOR flash memory. The paper focuses on the retention improvement in vertical NAND (V-NAND) flash memory using a 1-bit soft erase scheme. |
| The provided paper does not discuss the retention improvement of NOR flash memory. The paper focuses on the retention improvement in vertical NAND (V-NAND) flash memory using a 1-bit soft erase scheme. | |
| The paper discusses that the retention of NOR flash memory can be improved by choosing the proper thickness of the contact etch stop layer (CESL). | |
| The paper suggests that the retention of NOR flash memory can be improved by choosing the proper thickness of the contact etch stop layer (CESL). |
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