Production of field effect transistors?
The production of field effect transistors involves several key steps outlined in the provided research contexts. These steps include depositing semiconductor material on a substrate, forming gate dielectric layers, arranging gate electrode layers, creating contact trenches, back-producing gate electrodes, forming source/drain regions, and connecting them with contact structures . Additionally, methods include depositing insulating films, refractory metal films, and gate metals, etching to define gate structures, and utilizing etching stopper layers to maintain film thickness . Furthermore, the process may entail depositing conducting and insulating materials on a temporary substrate before transferring them to the final substrate . Techniques like self-assembled monolayers and Schottky junctions are also employed to enhance transistor performance, reduce resistance, and improve reliability .
Answers from top 4 papers
| Papers (4) | Insight |
|---|---|
| Production of field effect transistors involves creating a semiconductor web on a substrate, adding gate dielectric and electrode layers, forming source/drain regions, and connecting them with contact structures. | |
| The process involves substrate preparation, gate electrode deposition, organic compound self-assembly, etching, and post-etching reapplication, contributing to the production of field effect transistors. | |
| Field effect transistors are produced by depositing semiconductor material on temporary material, removing part of it, and forming conducting material above and beneath the semiconductor, with insulating material between. | |
| The method involves depositing insulating and refractory metal films on a semiconductor substrate, forming gate structures, and utilizing an etching stopper layer for precise production of field effect transistors. |