Showing papers on "Ion beam deposition published in 1969"
TL;DR: In this paper, the ion microprobe mass analyzer accomplishes the chemical analysis of a microvolume of a solid sample by sputtering ions from its surface with a high-energy beam of bombarding ions.
165 citations
TL;DR: In this article, a simple plasma ion source which is capable of delivering beams of 1×10−6 A at 200 eV and 0.1-0.2 eV energy spread is described.
Abstract: A simple plasma ion source which is capable of delivering beams of 1×10−6 A at 200 eV and 0.1–0.2 eV energy spread is described. Gas efficiencies of the order of percents are obtained. This source was found to be very successful in experiments using low energy beams in the electron volt region.
122 citations
TL;DR: In this paper, three methods of confining the angular dispersion of a field electron beam from 〈100〉 oriented tungsten emitters are investigated; they are (1) thermal field buildup, (2) selective work function reduction by zirconium adsorption, and (3) high temperature field evaporation.
Abstract: Three methods of confining the angular dispersion of a field electron beam from 〈100〉 oriented tungsten emitters are investigated; they are (1) thermal‐field buildup, (2) selective work function reduction by zirconium adsorption, and (3) high‐temperature field evaporation. All three methods confine the emission to a beam half‐angle of less than 9° in the dc current range 0.1 to 100 μA. Method (1) results in a ∼50% reduction in beam voltage. Provided that the vacuum level is good (∼10−10 Torr), long and short term current instabilities are negligible for dc current levels below 10 μA at 300°K for each of the emitter end forms investigated. The angular dispersion and beam voltage of a field ion beam can also be reduced by method (1) as described briefly in this paper.
77 citations
TL;DR: In this article, it is shown that the degree of ionization of secondary particles emitted from a solid surface under ion bombardment cannot be predicted by the Saha-Langmuir equation.
Abstract: It is demonstrated that the degree of ionization of secondary particles emitted from a solid surface under ion bombardment cannot be predicted by the Saha-Langmuir equation. For an understanding of the ion emission it is necessary to separate the process of ion formation and the following emission. There exists a great number of different processes resulting in the formation of an ion on the surface. These processes can be disentangled by means of a systematical mass spectrometrical analysis. The probability for an ion to leave the surface without neutralization depends on various parameters as ionization potential and velocity of the emitted particle, work function and temperature of the surface etc.
61 citations
TL;DR: In this article, a cross-beam apparatus for the study of ion-molecule reactions is described, which can provide information on the velocity and angular spectra of reaction products as well as on the angular displacement between reactant and product ions.
Abstract: A crossed‐beam apparatus for the study of ion‐molecule reactions is described. The device can provide information on the velocity and angular spectra of reaction products as well as on the angular displacement between reactant and product ions. It can thus yield data sufficient to provide a detailed characterization of the dynamics of the system studied. Furthermore, the mass selected ion beam is variable in energy from 100 eV down to the critical low energy region of about 1 eV or less. Although the apparatus thus seems to have broader capabilities than previously described beam devices, it is quite small and comparatively inexpensive.
50 citations
Patent•
18 Dec 1969TL;DR: An ion-beam deposition system including means for providing atoms of depositant material to an ionization region, first and second means for injecting electrons into the ionisation region to ionize said depositant atoms, means for periodically and individually energizing the first-and second-injecting means, and means for extracting and accelerating ions from the ionization regions to a substrate.
Abstract: An ion-beam deposition system including means for providing atoms of depositant material to an ionization region, first and second means for injecting electrons into the ionization region to ionize said depositant atoms, means for periodically and individually energizing the first and second injecting means, and means for extracting and accelerating ions from the ionization region to a substrate.
39 citations
TL;DR: In this article, the amplitude of the electrical currents obtained by collecting these ions onto a variety of electrodes depends on the distribution of the protons in the beam, and both analog and digital techniques have been used to determine beam position and profile.
Abstract: The nondestructive beam detector systems originated at Argonne National Laboratory allow continuous measurement of the proton beam position and beam profile in the Zero Gradient Synchrotron (ZGS) during the accelerating and targeting cycle. Nondestructive detection is accomplished by collecting the ions produced by the proton beam ionizing residual gas in the vacuum chamber. The amplitude of the electrical currents obtained by collecting these ions onto a variety of electrodes depends on the distribution of the protons in the beam. The characteristics of the electric signals make them suitable as inputs to computer systems. Both analog and digital techniques have been used to determine beam position and profile. These beam detection systems have been used for measuring the properties of the 50 MeV beam between the injector linac and the synchrotron ring; for studying the steering and the radial growth of the size of the beam during acceleration; and for measurements during the targeting sequences.
36 citations
Patent•
12 Nov 1969
Abstract: An ion source for separately ionizing a plurality of vaporized samples and focusing the ions produced by the ionization into an ion beam containing ions from each of the vaporized samples. The ion source comprises an ionization chamber having an aperture through which ions are emitted, means for emitting an electron beam into the ionization chamber, at least one ion control electrode for establishing an ion control field, and partition means for dividing the ionization chamber into a first and second electron bombardment chamber. The ion source also includes a first and second gas storage vessel for respectively introducing at least a first and second vaporized sample into the first and second electron bombardment chambers, respectively, so that the first and second vaporized samples are independently ionized.
18 citations
TL;DR: In this article, an optical pumping technique was used to polarize the nuclear spins of the ions, which were extracted in the manner of an rf ion source of conventional design.
17 citations
15 citations
TL;DR: A surface ionization source was designed and developed to produce useful ion beams of elements with ionization potentials up to about 6 eV by using iridium (work function 5.27 eV) as the ionizing surface as discussed by the authors.
Abstract: A surface ionization source was designed and developed to produce useful ion beams of elements with ionization potentials up to about 6 eV by using iridium (work function 5.27 eV) as the ionizing surface. Sources were operated successfully producing stable ion beams of aluminum, gallium, indium, and thallium with current densities up to 10 μA/cm2. Neutral atoms are shielded from the beam as it leaves the source by a special design geometry. The construction, developmental details, and operating parameters of the source are described.
Patent•
23 Jun 1969
TL;DR: In this paper, a small magnetic field is applied to the ion beam from the mass spectrometer ion source to deflect a substantial proportion of the relatively light carrier gas (e.g., helium) ions in the beam from impinging on the beam monitor electrode of the mass analyzer.
Abstract: A small magnetic field is applied to the ion beam from the mass spectrometer ion source to deflect a substantial proportion of the relatively light carrier gas (e.g., helium) ions in the beam from impinging on the beam monitor electrode of the mass spectrometer, while leaving the relatively heavy sample (e.g., hydrocarbon) ions substantially undeflected. This increases the detection sensitivity and alleviates the need for ion source retuning between recording and standby conditions.
Patent•
24 Jun 1969TL;DR: Ionization of a first beam of polarized neutral atoms is accomplished by a charge-transfer collision with a second beam of atoms as discussed by the authors, where the charge transfer collision is replaced by a collision between the two beams.
Abstract: Ionization of a first beam of polarized neutral atoms is accomplished by a charge-transfer collision with a second beam of atoms
TL;DR: Negative ion beams of μA intensity have been obtained for the elements of Group IIIB and VB, and also for Be, Cu, Ag, Sn, Ta, W, Hg and U.
TL;DR: In this paper, a monoplasmatron ion source with slit geometry was developed and the largest improvements were obtained by the reduction of the distance intermediate electrode-anode and the area of the intermediate electrode opening.
Patent•
01 May 1969
TL;DR: In this article, an ion beam source consisting of an ion source, ion accelerator and focusing system, and a velocity filter with a deflection plate pair is described, where the velocity filter provides for dispersion of ions according to their charge, mass and velocity.
Abstract: An ion beam source includes an ion source, ion accelerator and focusing system, and a velocity filter with a deflection plate pair. The velocity filter provides for dispersion of ions according to their charge, mass and velocity. The ion source includes a nonconducting barrel, a filament mounted in the barrel and an anode enclosing the barrel opening except for a source aperture. Filament current is arranged to provide an electron current to the anode, this electron current ionizes the charge material thus forming a plasma cloud for ejecting into the focusing and lens system, and then into a velocity filter causing separation of ion beam.
TL;DR: In this paper, the emittance of the magnetron ion source was measured in two perpendicular planes using electrostatic deflection, the beam was scanned over two apertures and the corresponding signal displayed on an oscilloscope screen.
TL;DR: In this paper, an ion-induced emission electron microscope is constructed, for which an ion source making use of high frequency gas discharge is developed, which provides a stable, and finely focused ion beam with a high density (3 mA/cm2), besides facilitates regulation of the extracted ion current.
Abstract: The ion-induced emission electron microscope is constructed, for which an ion source making use of high frequency gas discharge is developed. This ion source – compared with the conventional one of d.c. discharge–affords a stable, and finely focused ion beam with a high density (3 mA/cm2), besides facilitates regulation of the extracted ion current. In this emission electron microscope an improved image contrast due to selective contamination is observed on a carbon steel surface. The contrast is attributed to the rate of contamination growth on the specimen surface at its early stage. The rate is found to depend on the kind of bombarding ions and the crystallographical properties of the surface.
TL;DR: Ion, electron and neutral temperatures from ion composition distribution, assuming no change in vertical distribution within horizontal distance between upleg and downleg measurements as mentioned in this paper, assuming that the vertical distribution does not change.
Abstract: Ion, electron and neutral temperatures from ion composition distribution, assuming no change in vertical distribution within horizontal distance between upleg and downleg measurements
Patent•
17 Dec 1969TL;DR: In a calutron-type ion source, enhanced ion production and extraction are accomplished by orienting the ionizing electron beam in a non-parallel relationship to the arc slit from which the ions are extracted.
Abstract: In a calutron-type ion source, enhanced ion production and extraction are accomplished by orienting the ionizing electron beam in a nonparallel relationship to the arc slit from which the ions are extracted. This may be accomplished by canting the ion source a few degrees with respect to the magnetic field that confines the ionized beam or, preferably, by positioning the ion source conventionally and canting the magnetic field with respect to it.
TL;DR: In this article, an ion source and analysis system was described which yields beams of negative ions with a spread in energy of ± 1·5 ev at maximum currents ranging from 5 pA at 5 ev to 0·5 nA at 100 ev.
Abstract: An ion source and analysis system is described which yields beams of negative ions with a spread in energy of ± 1·5 ev at maximum currents ranging from 5 pA at 5 ev to 0·5 nA at 100 ev.
TL;DR: In this article, the neutralization of a mercury ion beam ejected from an electron bombardment source is studied and it is shown that if the temperature of the neutralizer is high enough a complete charge and current neutralization occurs.
Abstract: Neutralization of a mercury ion beam ejected from an electron bombardment source is studied. The electrons are emitted from a hot filament located close to the ion source. It is shown that if the temperature of the neutralizer is high enough a complete charge and current neutralization occurs. The neutralizer is surrounded by a plasma sheath which is calculated. The stability of the synthesized plasma resulting from the neutralized beam is investigated.