A
Alexandros T. Demos
Researcher at Applied Materials
Publications - 60
Citations - 1701
Alexandros T. Demos is an academic researcher from Applied Materials. The author has contributed to research in topics: Dielectric & Layer (electronics). The author has an hindex of 15, co-authored 60 publications receiving 1701 citations.
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Patent
Enhancement of remote plasma source clean for dielectric films
Thomas Nowak,Kang Sub Yim,Sum-Yee Betty Tang,Kwangduk Douglas Lee,Vu Ngoc Tran Nguyen,Dennis Singleton,Martin Jay Seamons,Karthik Janakiraman,Ganesh Balasubramanian,Mohamed Ayoub,Wendy H. Yeh,Alexandros T. Demos,Hichem M'Saad +12 more
TL;DR: In this article, a remote plasma source is used to generate reactive species that clean interior surfaces of a processing chamber in the absence of RF power in the chamber, such as amorphous carbon films, barrier films comprising silicon and carbon, and low dielectric constant films.
Patent
Post treatment of low k dielectric films
Zhenjiang Cui,Josephine J. Chang,Alexandros T. Demos,Reza Arghavani,Derek R. Witty,Helen R. Armer,Girish Dixit,Hichem M'Saad +7 more
TL;DR: In this article, a method of depositing a low dielectric constant film on a substrate and post-treating the low-dielectric-constant film is provided.
Patent
Apparatus for reducing plasma charge damage for plasma processes
TL;DR: In this article, a method for depositing a thin film on a substrate in a process chamber with reduced incidence of plasma charge damage is described. But the method is not suitable for the case of high temperature.
Patent
Process for lowering adhesion layer thickness and improving damage resistance for thin ultra low-k dielectric film
TL;DR: In this paper, an improved method for depositing an ultra low dielectric constant film stack is provided, which reduces a thickness of an oxide adhesion layer in the ultra low Dielectric film stack, thereby lowering the thickness non-uniformity of the film stack to less than 2%.
Patent
Quartz showerhead for nanocure UV chamber
TL;DR: In this article, an ultraviolet processing chamber defining a processing region, a substrate support, a window disposed between a UV radiation source and substrate support and a transparent showerhead disposed within the processing region between the window and the substrate support was described.