A
Antti Rahtu
Researcher at ASM International
Publications - 38
Citations - 4247
Antti Rahtu is an academic researcher from ASM International. The author has contributed to research in topics: Atomic layer deposition & Thin film. The author has an hindex of 26, co-authored 38 publications receiving 4092 citations. Previous affiliations of Antti Rahtu include Helsinki University of Technology & Harvard University.
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Atomic layer deposition of transition metals
TL;DR: The use of water vapour in place of hydrogen gas gives highly uniform, conformal films of metal oxides, including lanthanum oxide, and it is proposed that these ALD layers grow by a hydrogenation mechanism that should also operate during the ALD of many other metals.
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Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources
Mikko Ritala,Kaupo Kukli,Antti Rahtu,Petri Räisänen,Markku Leskelä,Timo Sajavaara,Juhani Keinonen +6 more
TL;DR: This finding adds to the other benefits of the ALD method, especially the atomic-level thickness control and excellent uniformity, and takes a major step toward the scientifically challenging and technologically important task of replacing silica as the gate dielectric in the future generations of metal oxide semiconductor field effect transistors.
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Synthesis and Characterization of Volatile, Thermally Stable, Reactive Transition Metal Amidinates
TL;DR: The new compounds were found to have properties well-suited for use as precursors for atomic layer deposition (ALD) of thin films, and have high volatility, high thermal stability, and high and properly self-limited reactivity with molecular hydrogen, depositing pure metals, or water vapor, deposging metal oxides.
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Effect of water dose on the atomic layer deposition rate of oxide thin films
TL;DR: In this paper, the growth rate and properties of atomic layer deposited (ALD) Al 2 O 3 thin films were examined by varying the water dose in the Al(CH 3 ) 3 -H 2 O process at growth temperatures of 150-500°C.
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Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum
TL;DR: In this paper, the reaction mechanism in atomic layer deposition (ALD) of ruthenium from biscyclopentadienyl ruthensium (RuCp 2 ) and oxygen were studied in situ with a quadruple mass spectrometer (QMS) and a quartz crystal microbalance (QCM).