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Benjamin M. Klahr
Researcher at Michigan State University
Publications - 16
Citations - 3728
Benjamin M. Klahr is an academic researcher from Michigan State University. The author has contributed to research in topics: Hematite & Thin film. The author has an hindex of 15, co-authored 16 publications receiving 3271 citations. Previous affiliations of Benjamin M. Klahr include United States Department of Energy & Northwestern University.
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Journal ArticleDOI
Water Oxidation at Hematite Photoelectrodes: The Role of Surface States
TL;DR: The utility of impedance spectroscopy in investigations of hematite electrodes is demonstrated to provide key parameters of photoelectrodes with a relatively simple measurement, and new evidence of the accumulation of holes in surface states at the semiconductor/electrolyte interface, which are responsible for water oxidation.
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Photoelectrochemical and Impedance Spectroscopic Investigation of Water Oxidation with "Co−Pi"-Coated Hematite Electrodes
TL;DR: It was found that under illumination, the Co-Pi catalyst can efficiently collect and store photogenerated holes from the hematite electrode and produce increased water oxidation efficiencies which is attributed to a combination of superior charge separation and increased surface area of the porous catalytic film.
Journal ArticleDOI
Electrochemical and photoelectrochemical investigation of water oxidation with hematite electrodes
TL;DR: In this paper, a combination of electrochemical impedance spectroscopy, photoelectrochemical and electrochemical measurements were employed to determine the cause of the additional overpotential needed to initiate water oxidation compared to the fast redox shuttle.
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Directed Growth of Electroactive Metal-Organic Framework Thin Films Using Electrophoretic Deposition
Idan Hod,Wojciech Bury,Wojciech Bury,David M. Karlin,Pravas Deria,Chung Wei Kung,Michael J. Katz,Monica C. So,Benjamin M. Klahr,Danni Jin,Yip-Wah Chung,Teri W. Odom,Omar K. Farha,Omar K. Farha,Joseph T. Hupp +14 more
TL;DR: Electrophoretic deposition is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-film form and pattern the growth of NU-1000 thin films that exhibit full electrochemical activity.
Journal ArticleDOI
Atomic layer deposition of a submonolayer catalyst for the enhanced photoelectrochemical performance of water oxidation with hematite.
Shannon C. Riha,Benjamin M. Klahr,Eric C. Tyo,Sönke Seifert,Stefan Vajda,Michael J. Pellin,Thomas W. Hamann,Alex B. F. Martinson +7 more
TL;DR: The optimal coating-1 ALD cycle, which amounts to <1 monolayer of Co(OH)2/Co3O4-resulted in significantly enhanced photoelectrochemical water oxidation performance and establishes it as a particularly advantageous treatment for nanostructured water oxidation photoanodes.