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D. M. Riffe

Researcher at Utah State University

Publications -  53
Citations -  1859

D. M. Riffe is an academic researcher from Utah State University. The author has contributed to research in topics: Femtosecond & Phonon. The author has an hindex of 21, co-authored 52 publications receiving 1749 citations. Previous affiliations of D. M. Riffe include Cornell University & University of Texas at Austin.

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Time-resolved electron-temperature measurement in a highly excited gold target using femtosecond thermionic emission.

TL;DR: Direct measurement of hot-electron temperatures and relaxation dynamics for peak electron temperatures between 3400 and 11000 K utilizing two-pulse-correlation femtosecond thermionic emission is reported.
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Femtosecond Pump-Probe Reflectivity Study of Silicon Carrier Dynamics

TL;DR: In this article, the authors studied the ultrafast optical response of nativeoxide terminated Si(001) with pump-probe reflectivity using 800 nm, 28 fs pulses at an excitation density of $(5.5\ifmmode\pm\else\textpm\fi{}
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Alkali metal adsorbates on W(110): Ionic, covalent, or metallic?

TL;DR: There is little or no charge transfer from the alkali metal to the W surface, even in the limit of low coverage, which fully support recent theoretical calculations.
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Femtosecond thermionic emission from metals in the space-charge-limited regime

TL;DR: In this paper, femtosecond-laser-pulse-induced electron emission from W(100), Al(110), and Ag(111) in the sub-damage regime (1-44 mJ/cm2 fluence) was studied by simultaneously measuring the incident-light reflectivity, total electron yield, and electron energy distribution curves of the emitted electrons.
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Measurement of silicon surface recombination velocity using ultrafast pump–probe reflectivity in the near infrared

TL;DR: In this paper, the authors demonstrate that ultrafast pump-probe reflectivity measurements from bulk Si samples using a Ti:sapphire femtosecond oscillator (λ=800nm) can be used to measure the Si surface recombination velocity.