Over the past three decades a new spectroscopic technique with unique possibilities has emerged. Based on coherent and time-resolved detection of the electric field of ultrashort radiation bursts in the far-infrared, this technique has become known as terahertz time-domain spectroscopy (THz-TDS). In this review article the authors describe the technique in its various implementations for static and time-resolved spectroscopy, and illustrate the performance of the technique with recent examples from solid-state physics and physical chemistry as well as aqueous chemistry. Examples from other fields of research, where THz spectroscopic techniques have proven to be useful research tools, and the potential for industrial applications of THz spectroscopic and imaging techniques are discussed.

Terahertz spectroscopy and imaging – Modern techniques and applications

Six years after their birth, terahertz quantum-cascade lasers can now deliver milliwatts or more of continuous-wave coherent radiation throughout the terahertz range — the spectral regime between millimetre and infrared wavelengths, which has long resisted development. This paper reviews the state-of-the-art and future prospects for these lasers, including efforts to increase their operating temperatures, deliver higher output powers and emit longer wavelengths.

Terahertz quantum-cascade lasers

Epitaxial GaAs grown by molecular beam epitaxy (MBE) at low substrate temperatures is observed to have a significantly shorter carrier lifetime than GaAs grown at normal substrate temperatures. Using femtosecond time‐resolved‐reflectance techniques, a sub‐picosecond (<0.4 ps) carrier lifetime has been measured for GaAs grown by MBE at ∼200°C and annealed at 600 °C. With the same material as a photoconductive switch we have measured electrical pulses with a full‐width at half‐maximum of 0.6 ps using the technique of electro‐optic sampling. Good responsivity for a photoconductive switch is observed, corresponding to a mobility of the photoexcited carriers of ∼120–150 cm2/V s. GaAs grown by MBE at 200 °C and annealed at 600 °C is also semi‐insulating, which results in a low dark current in the switch application. The combination of fast recombination lifetime, high carrier mobility, and high resistivity makes this material ideal for a number of subpicosecond photoconductive applications.

/pdf/subpicosecond-carrier-lifetime-in-gaas-grown-by-molecular-3idb8djcov.pdf

Subpicosecond carrier lifetime in GaAs grown by molecular beam epitaxy at low temperatures

Over the past 2 decades there has been tremendous advancements in the field of ultrafast carrier dynamics in semiconductors. The driving force behind this movement other than the basic fundamental interest is the direct application of semiconductor devices and the endless need for faster response and faster processing of information. To improve and develop microelectronics devices and address these needs, there must be a basic understanding of the various dynamical processes in the semiconductors which have to be studied in detail. Therefore, the excitation of semiconductors out of their equilibrium and the subsequent relaxation processes with various rates has become a key area of semiconductor research. With the development of lasers that can generate pulses as short as a few femtoseconds the excitation and subsequent probing of semiconductors on an ultrashort timescale have become routine. Processes such as carrier momentum randomization, carrier thermalization, and energy relaxation have been studied in detail using excite-and-probe novel techniques. This article reviews the status of ultrafast carrier and phonon dynamics in semiconductors. Experimental techniques such as excite-and-probe transmission, time-resolved up-conversion luminescence, and pump-probe Raman scattering along with some of the significant experimental findings from probing semiconductors are discussed. Finally, a selfconsistent theoretical model, which correlates the carrier and phonon dynamics in germanium on an ultrashort time scale, is described in detail.

Probing ultrafast carrier and phonon dynamics in semiconductors

In the presence of an electric field, the dielectric constant of a semiconductor exhibits Franz–Keldysh oscillations (FKO), which can be detected by modulated reflectance. Although it could be a powerful and simple method to study the electric fields/charge distributions in various semiconductor structures, in the past it has proven to be more complex. This is due to nonuniform fields and impurity induced broadening, which reduce the number of detectible Franz–Keldysh oscillations, and introduce uncertainties into the measurement. In 1989, a new structure, surface–undoped–doped (s‐i‐n+/s‐i‐p+) was developed, which allows the observation of a large number of FKOs and, hence, permitting accurate determination of electric fields. We present a review of the work on measuring electric fields in semiconductors with a particular emphasis on microstructures using the specialized layer sequence. We first discuss the general theory of modulation techniques dwelling on the approximations and their relevance. The cas...

Franz–Keldysh oscillations in modulation spectroscopy

Arsenic precipitates have been observed in GaAs low‐temperature buffer layers (LTBLs) used as ‘‘substrates’’ for normal molecular beam epitaxy growth. Transmission electron microscopy has shown the arsenic precipitates to be hexagonal phase single crystals. The precipitates are about 6±4 nm in diameter with a density on the order of 1017 precipitates per cm3. The semi‐insulating properties of the LTBL can be explained in terms of these arsenic precipitates acting as ‘‘buried’’ Schottky barriers with overlapping spherical depletion regions. The implications of these results on LTBL resistivity stability with respect to doping and anneal temperature will be discussed as will the possible role of arsenic precipitates in semi‐insulating liquid‐encapsulated Czochralski‐grown bulk GaAs.

Arsenic precipitates and the semi‐insulating properties of GaAs buffer layers grown by low‐temperature molecular beam epitaxy

A doped or undoped photoresponsive material having metallic precipitates, and a PiN photodiode utilizing the material for detecting light having a wavelength of 1.3 micrometers. The PiN photodiode includes a substrate having a first compound semiconductor layer disposed thereon. The PiN photodiode further includes an optically responsive compound semiconductor layer disposed above the first compound semiconductor layer. The optically responsive layer includes a plurality of buried Schottky barriers, each of which is associated with an inclusion within a crystal lattice of a Group III-V material. The PiN device also includes a further compound semiconductor layer disposed above the optically responsive layer. For a transversely illuminated embodiment, waveguiding layers may also be disposed above and below the PiN structure. In one example the optically responsive layer is comprised of GaAs:As. The GaAs:As exhibits a very low room temperature dark current, even under forward bias conditions, and a responsivity to 1.3 micrometer radiation modulated at frequencies greater than 1 GHz.

Method of making a compound semiconductor having metallic inclusions

The fabrication of a GaAs detector which operates in the 1.3- to 1.5- mu m optical range is reported. The detector is a P-i-N photodiode with an intrinsic layer composed of undoped GaAs which was grown at 225 degrees C and subsequently annealed at 600 degrees C. This growth process has been demonstrated to produce a high density of As precipitates in the low-temperature grown region, which the authors show to exhibit absorption through internal photoemission. The internal Schottky barrier height of the As precipitates is found to be 0.7 eV, leading to reasonable room-temperature responsivity out to around 1.7 mu m. >

1.3- mu m P-i-N photodetector using GaAs with As precipitates (GaAs:As)

The unpinning of the etched GaAs(100) surface has recently been reported by both photowashing and by Na2S⋅9H2O treatments. Both techniques hold promise of elucidating the mechanism by which GaAs passivation is achieved. We have identified as part of the photowashing process a separate photoactivation step. The activation step did not become apparent until we modified the photowash process in order to minimize light exposure when flowing water was not applied to the substrate. The degree of unpinning produced by this process has been found to be related to the thickness of this oxide, the presence of oxygen and water vapor and the integrated light flux incident on the sample. Photoluminescence experiments clearly show that a photoactivation step involving water vapor is required to achieve the flat‐band condition. This process is relatively insensitive to the surface treatment prior to the photowash. We have observed similar photoactivation and insensitivity to surface treatment on GaAs coated with Na2S⋅9H...

Characterization of photochemically unpinned GaAs

A tunnel diode was formed from GaAs containing excess arsenic incorporated by molecular beam epitaxy at reduced substrate temperatures. The incorporation of excess arsenic during growth results in a more efficient incorporation of silicon on donor sites and beryllium on acceptor sites. The better dopant incorporation, along with trap assisted tunneling through deep levels associated with the excess arsenic, results in a tunnel junction with record peak current density of over 1800 A/cm2, zero-bias specific resistance of under 1×10−4 Ω cm, and a room-temperature peak-to-valley current ratio of 28.

D. T. McInturff

Papers

Arsenic precipitates and the semi‐insulating properties of GaAs buffer layers grown by low‐temperature molecular beam epitaxy

Method of making a compound semiconductor having metallic inclusions

1.3- mu m P-i-N photodetector using GaAs with As precipitates (GaAs:As)

Characterization of photochemically unpinned GaAs

Use of nonstoichiometry to form GaAs tunnel junctions